A row of regularly spaced, cylindrical healing elements (1) is used to cure a surface coating that is applied to a large panel (2) positioned below the elements. A second large panel (3), whose top surface is well insulated, is positioned above the elements. The elements are black and maintained at T 1 = 600 K , while the panel has an emissivity of ε 2 = 0.5 and is maintained at T 2 = 400 K . The cavity is tilled with a nonparticipating gas and convection heat transfer occurs a surfaces 1 and 2, with h ¯ 1 = 10 W/m 2 ⋅ K and h ¯ 2 = 2 W/m 2 ⋅ K . (Convection at the Insulated panel may be neglected.) (a) Evaluate the mean gas temperature, T m . (b) What is the rate per Unit axial length at which electrical energy must be supplied to each element to maintain its prescribed temperature? (c) What is the rate of heat transfer to a portion of the coated panel that is 1 m wide by 1 m long?
A row of regularly spaced, cylindrical healing elements (1) is used to cure a surface coating that is applied to a large panel (2) positioned below the elements. A second large panel (3), whose top surface is well insulated, is positioned above the elements. The elements are black and maintained at T 1 = 600 K , while the panel has an emissivity of ε 2 = 0.5 and is maintained at T 2 = 400 K . The cavity is tilled with a nonparticipating gas and convection heat transfer occurs a surfaces 1 and 2, with h ¯ 1 = 10 W/m 2 ⋅ K and h ¯ 2 = 2 W/m 2 ⋅ K . (Convection at the Insulated panel may be neglected.) (a) Evaluate the mean gas temperature, T m . (b) What is the rate per Unit axial length at which electrical energy must be supplied to each element to maintain its prescribed temperature? (c) What is the rate of heat transfer to a portion of the coated panel that is 1 m wide by 1 m long?
Solution Summary: The equation for the energy balance equation is given by, lstackrel
A row of regularly spaced, cylindrical healing elements (1) is used to cure a surface coating that is applied to a large panel (2) positioned below the elements. A second large panel (3), whose top surface is well insulated, is positioned above the elements. The elements are black and maintained at
T
1
=
600
K
, while the panel has an emissivity of
ε
2
=
0.5
and is maintained at
T
2
=
400
K
. The cavity is tilled with a nonparticipating gas and convection heat transfer occurs a surfaces 1 and 2, with
h
¯
1
=
10
W/m
2
⋅
K
and
h
¯
2
=
2
W/m
2
⋅
K
. (Convection at the Insulated panel may be neglected.)
(a) Evaluate the mean gas temperature, Tm. (b) What is the rate per Unit axial length at which electrical energy must be supplied to each element to maintain its prescribed temperature? (c) What is the rate of heat transfer to a portion of the coated panel that is 1 m wide by 1 m long?
An opaque surface at 1000 K if its spectral
emissivity is = 0.4, 0.7, and 0.3 for 0 < < 2 µm,
2μm < 6 μm, and 6um
as fast as.
A thin, disk-shaped silicon wafer of diameter D=20 cm on a production line must be maintained at a temperature of 100 deg C. The wafer loses heat to the room by convection and radiation from its upper surface, while heat is supplied at a constant flux from below. The surrounding air is at 20 deg C, while all surrounding surfaces (which can be treated as blackbodies) can be approximated to be isothermal at a temperature of 15 deg C. The wafer-to-air heat transfer coefficient is 30 W/m2-K and the emissivity of the wafer’s surface (which can be approximated to be gray) is 0.85. How much heat (in W) must be supplied to the wafer?
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