A novel scheme for dissipating heat from the chips ofa multichip array involves machining coolant channelsin the ceramic substrate to which the chips areattached. The square chips ( L C = 5 mm ) are alignedabove each of the channels, with longitudinal andtransverse pitches of S L = S T = 20 mm . Water flowsthrough the square cross section ( W = 5 mm ) of eachchannel with a mean velocity of u m = 1 m / s . and itsproperties may be approximated as ρ = 1000 k g / m 3 , c p = 4180 K/kg ⋅ K, μ =855×10 -6 kg/s ⋅ m,k = 0.610 W/m ⋅ K and P r = 5 . 8 . Symmetry in the transversedirection dictates the existence of equivalent conditionsfor each substrate section of length L S and width S T . (a) Consider a substrate whose length in the flow direction is L S = 200 mm. thereby providing a total of N L = 10 chips attached in-line above each flow channel. To a good approximation, all the heat dissipated by the chips above a channel may be assumed to be transferred to the water flowing through the channel. If each chip dissipates 5 W. what is the temperature rise of the water passing through the channel? (b) The chip-substrate contact resistance is R i , c n = 0.5 × 10 − 4 m 2 ⋅ K/W , and the three-dimensional conduction resistance for the L S × S T substrate section is R c o n d = 0.120 K/W . If water enters the substrate at 25 ° C and is in hilly developed flow, estimate the temperature T c of the chips and the temperature T s of the substrate channel surface.
A novel scheme for dissipating heat from the chips ofa multichip array involves machining coolant channelsin the ceramic substrate to which the chips areattached. The square chips ( L C = 5 mm ) are alignedabove each of the channels, with longitudinal andtransverse pitches of S L = S T = 20 mm . Water flowsthrough the square cross section ( W = 5 mm ) of eachchannel with a mean velocity of u m = 1 m / s . and itsproperties may be approximated as ρ = 1000 k g / m 3 , c p = 4180 K/kg ⋅ K, μ =855×10 -6 kg/s ⋅ m,k = 0.610 W/m ⋅ K and P r = 5 . 8 . Symmetry in the transversedirection dictates the existence of equivalent conditionsfor each substrate section of length L S and width S T . (a) Consider a substrate whose length in the flow direction is L S = 200 mm. thereby providing a total of N L = 10 chips attached in-line above each flow channel. To a good approximation, all the heat dissipated by the chips above a channel may be assumed to be transferred to the water flowing through the channel. If each chip dissipates 5 W. what is the temperature rise of the water passing through the channel? (b) The chip-substrate contact resistance is R i , c n = 0.5 × 10 − 4 m 2 ⋅ K/W , and the three-dimensional conduction resistance for the L S × S T substrate section is R c o n d = 0.120 K/W . If water enters the substrate at 25 ° C and is in hilly developed flow, estimate the temperature T c of the chips and the temperature T s of the substrate channel surface.
A novel scheme for dissipating heat from the chips ofa multichip array involves machining coolant channelsin the ceramic substrate to which the chips areattached. The square chips (
L
C
=
5
mm
) are alignedabove each of the channels, with longitudinal andtransverse pitches of
S
L
=
S
T
=
20
mm
. Water flowsthrough the square cross section (
W
=
5 mm
) of eachchannel with a mean velocity of
u
m
=
1
m
/
s
. and itsproperties may be approximated as
ρ
=
1000
k
g
/
m
3
,
c
p
=
4180
K/kg
⋅
K,
μ
=855×10
-6
kg/s
⋅
m,k
=
0.610
W/m
⋅
K
and
P
r
=
5
.
8
. Symmetry in the transversedirection dictates the existence of equivalent conditionsfor each substrate section of length
L
S
and width
S
T
.
(a) Consider a substrate whose length in the flow direction is
L
S
=
200
mm. thereby providing a total of
N
L
=
10
chips attached in-line above each flow channel. To a good approximation, all the heat dissipated by the chips above a channel may be assumed to be transferred to the water flowing through the channel. If each chip dissipates 5 W. what is the temperature rise of the water passing through the channel?
(b) The chip-substrate contact resistance is
R
i
,
c
n
=
0.5
×
10
−
4
m
2
⋅
K/W
, and the three-dimensional conduction resistance for the
L
S
×
S
T
substrate section is
R
c
o
n
d
=
0.120
K/W
. If water enters the substrate at
25
°
C
and is in hilly developed flow, estimate the temperature
T
c
of the chips and the temperature
T
s
of the substrate channel surface.
1. A 40 lb. force is applied at point E. There are pins at
A, B, C, D, and F and a roller at A.
a. Draw a FBD of member EFC showing all the known and
unknown forces acting on it.
b. Draw a FBD of member ABF showing all the known and
unknown forces acting on it.
c. Draw a FBD of member BCD showing all the known and
unknown forces acting on it.
d. Draw a FBD of the entire assembly ADE showing all the
known and unknown forces acting on it.
e. Determine the reactions at A and D.
f. Determine the magnitude of the pin reaction at C.
40 lbs.
B
A
6 in.
4 in.
D
F
-5 in.4 in 4.
A crude oil of specific gravity0.85 flows upward at a volumetric rate of flow of 70litres per
second through
a vertical
venturimeter,with an inlet diameter of 250 mm and a throat
diameter of 150mm. The coefficient
of discharge of venturimeter is 0.96. The vertical
differences betwecen the pressure toppings is
350mm.
i)
Draw a well labeled diagram to represent the above in formation
i)
If the two pressure gauges are connected at the tapings such that they are
positioned at the levels of their corresponding tapping points,
determine the
difference of readings in N/CM² of the two pressure gauges
ii)
If a mercury differential
manometer
is connected in place of pressure gauges,
to the tappings such that the connecting tube up to mercury are filled with oil
determine the difference in the level of mercury column.
Can you solve it analytically using laplace transforms and with Matlab code as well please. Thank You
Java How to Program, Early Objects (11th Edition) (Deitel: How to Program)
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