Oxidation number of silicon in anion formed after glass is etched has to be determined. Concept Introduction: Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows: SiO 2 + HF → SiF 4 + H 2 O SiF 4 + HF → [ SiF 6 ] 2 − + H 2

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Answer 1

Question

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

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Answer 2

Question

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

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Answer 3

Question

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

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Answer 4

Question

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

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Answer 5

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

Answer 6

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

Answer 7

Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by HF then reaction for this process is as follows:

SiO2+HF→SiF4+H2OSiF4+HF→[SiF6]2−+H2

Answer 8

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Answer 9

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Answer 10

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Answer 11

Ch. 3 - Prob. 3A.1AST Ch. 3 - Prob. 3A.1BST Ch. 3 - Prob. 3A.2AST Ch. 3 - Prob. 3A.2BST Ch. 3 - Prob. 3A.3AST Ch. 3 - Prob. 3A.3BST Ch. 3 - Prob. 3A.1E Ch. 3 - Prob. 3A.2E Ch. 3 - Prob. 3A.3E Ch. 3 - Prob. 3A.4E

Solution Summary: The author explains that oxidation number of silicon in anion formed after glass is etched has to be determined.

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