Chapter 3, Problem 3.65E

Interpretation Introduction

Interpretation:

Oxidation number of silicon in anion formed after glass is etched has to be determined.

Concept Introduction:

Glass etching involves technique to create art on glass either through chemical method or mechanical method. If glass is etched by $\text{HF}$ then reaction for this process is as follows:

  $\begin{array}{l}{\text{SiO}}_2+\text{HF}\to {\text{SiF}}_4+{\text{H}}_2\text{O}\\ {\text{SiF}}_4+\text{HF}\to {\left[{\text{SiF}}_6\right]}^{2-}+{\text{H}}_2\end{array}$