Manufacturing Engineering & Technology
Manufacturing Engineering & Technology
7th Edition
ISBN: 9780133128741
Author: Serope Kalpakjian, Steven Schmid
Publisher: Prentice Hall
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Chapter 28, Problem 30QTP
To determine

A chlorine-based polysilicon etching process displays a polysilicon-to-resist selectivity of 5:1 and a polysilicon-to oxide selectivity of 60:1 . Estimate the amount of resist and exposed oxide will be consumed in etching  3500 of poly silicon. Determine the poly silicon-to-oxide selectivity have to be in order to reduce the loss to only 40A0 of exposed oxide.

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Manufacturing Engineering & Technology

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