Similarity between wet etching and plasma etching should be explained. Concept introduction: Microfabrication is a process through which nearly all the semiconductor type materials and circuits are fabricated. The microfabricated devices are formed over the substrate surface with one or more thin films. In most of the devices, silicon wafers are generally used as substrate. The insertion of desirable pattern is done through masking, in which a certain portion of the film is detected which is to be removed for insertion. Etching is the process of removing a small portion of that thin film or substrate from the device. This etching can be of two types; dry etching (plasma etching) or wet etching (chemical etching).

Question

Want to see the full answer?

Answer 1

Question

Chapter 8, Problem 8.72PAE

Interpretation Introduction

Interpretation:

Similarity between wet etching and plasma etching should be explained.

Concept introduction:

Microfabrication is a process through which nearly all the semiconductor type materials and circuits are fabricated. The microfabricated devices are formed over the substrate surface with one or more thin films. In most of the devices, silicon wafers are generally used as substrate.

The insertion of desirable pattern is done through masking, in which a certain portion of the film is detected which is to be removed for insertion.

Etching is the process of removing a small portion of that thin film or substrate from the device.

This etching can be of two types; dry etching (plasma etching) or wet etching (chemical etching).

Expert Solution & Answer

Want to see the full answer?

Check out a sample textbook solution

See solution

Students have asked these similar questions

Protecting Groups and Carbonyls 6) The synthesis generates allethrolone that exhibits high insect toxicity but low mammalian toxicity. They are used in pet shampoo, human lice shampoo, and industrial sprays for insects and mosquitos. Propose detailed mechanistic steps to generate the allethrolone label the different types of reagents (Grignard, acid/base protonation, acid/base deprotonation, reduction, oxidation, witting, aldol condensation, Robinson annulation, etc.) III + VI HS HS H+ CH,CH,Li III I II IV CI + P(Ph)3 V ༼ Hint: no strong base added VI S VII IX HO VIII -MgBr HgCl2,HgO HO. isomerization aqeuous solution H,SO, ༽༽༤༽༽ X MeOH Hint: enhances selectivity for reaction at the S X ☑

Draw the complete mechanism for the acid-catalyzed hydration of this alkene. esc 田 Explanation Check 1 888 Q A slock Add/Remove step Q F4 F5 F6 A བྲA F7 $ % 5 @ 4 2 3 & 6 87 Click and drag to start drawing a structure. © 2025 McGraw Hill LLC. All Rights Reserved. Terms of Use | Privacy Ce W E R T Y U S D LL G H IK DD 요 F8 F9 F10 F1 * ( 8 9 0 O P J K L Z X C V B N M H He command

Explanation Check F1 H₂O H₂ Pd 1) MCPBA 2) H3O+ 1) Hg(OAc)2, H₂O 2) NaBH4 OH CI OH OH OH hydration halohydrin formation addition halogenation hydrogenation inhalation hydrogenation hydration ☐ halohydrin formation addition halogenation formation chelation hydrogenation halohydrin formation substitution hydration halogenation addition Ohalohydrin formation subtraction halogenation addition hydrogenation hydration F2 80 F3 σ F4 F5 F6 1 ! 2 # 3 $ 4 % 05 Q W & Å © 2025 McGraw Hill LLC. All Rights Reserved. F7 F8 ( 6 7 8 9 LU E R T Y U A F9