A p-n junction made of Silicon has an intrinsic carrier concentration of 1.1 × 10¹⁰ cm-³, a donor concentration of 1.5 × 10¹7 cm-3 and an acceptor concentration of 0.6 x 10¹6 cm-3 at room temperature (300 K). (i) (ii) (iii) Calculate the built-in potential established in the p-n junction. Give your answer to 2 d.p. Determine the voltage drop across the depletion layer on the n- side? Hint: Calculate this by finding the change in Fermi level (relative to the intrinsic level) on the n-side. What are the two mechanisms responsible for the breakdown of a p-n junction when reverse biased?

Question
A p-n junction made of Silicon has an intrinsic carrier concentration of
1.1 × 10¹⁰ cm−³, a donor concentration of 1.5 × 10¹7 cm-³ and an acceptor
concentration of 0.6 × 10¹6 cm−³ at room temperature (300 K).
(i)
(ii)
(iii)
Calculate the built-in potential established in the p-n junction. Give
your answer to 2 d.p.
Determine the voltage drop across the depletion layer on the n-
side?
Hint: Calculate this by finding the change in Fermi level (relative
to the intrinsic level) on the n-side.
What are the two mechanisms responsible for the breakdown of a
p-n junction when reverse biased?
Transcribed Image Text:A p-n junction made of Silicon has an intrinsic carrier concentration of 1.1 × 10¹⁰ cm−³, a donor concentration of 1.5 × 10¹7 cm-³ and an acceptor concentration of 0.6 × 10¹6 cm−³ at room temperature (300 K). (i) (ii) (iii) Calculate the built-in potential established in the p-n junction. Give your answer to 2 d.p. Determine the voltage drop across the depletion layer on the n- side? Hint: Calculate this by finding the change in Fermi level (relative to the intrinsic level) on the n-side. What are the two mechanisms responsible for the breakdown of a p-n junction when reverse biased?
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