Chemical formula of fluoride and reaction to achieve etching of glass has to be determined. Concept Introduction: Chemical formula of silica is SiO 2 . In SiO 2 , central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO 2 is linear with no distortions thus bond angle of Si − O − Si in silica is 180 ° .

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Answer 1

Question

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

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Answer 2

Question

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

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Answer 3

Question

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

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Answer 4

Question

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

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Answer 5

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

Answer 6

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

Answer 7

Chapter 3, Problem 3.66E

Interpretation Introduction

Interpretation:

Chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

Concept Introduction:

Chemical formula of silica is SiO2. In SiO2, central silicon has 2 bond pairs with oxygen and no lone pair. Therefore with steric number 2 the ideal arrangement so as to have minimum repulsions is linear shape in accordance with VSPER model. Since shape of SiO2 is linear with no distortions thus bond angle of Si−O−Si in silica is 180°.

Answer 8

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Answer 9

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Answer 10

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Answer 11

Ch. 3 - Prob. 3A.1AST Ch. 3 - Prob. 3A.1BST Ch. 3 - Prob. 3A.2AST Ch. 3 - Prob. 3A.2BST Ch. 3 - Prob. 3A.3AST Ch. 3 - Prob. 3A.3BST Ch. 3 - Prob. 3A.1E Ch. 3 - Prob. 3A.2E Ch. 3 - Prob. 3A.3E Ch. 3 - Prob. 3A.4E

Solution Summary: The author explains the chemical formula of fluoride and reaction to achieve etching of glass has to be determined.

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Chapter 3 Solutions