Consider a homogeneously doped n-type semiconductor at 300K. The electron concentration is equal to 105 cm, n= 10"cm, = 1000 em?/V-sec, ,= 500 cm'V-sec, To-2x10's, Tyo=1×10's and the applied electric field is zero. A light beam in x-direction was applied to the sample resulting excess e-h pair of 2x102 cm at x=0(edge of the sample). Assuming steady state, then hole diffusion current density at x=20um is .. LA/cm?. (use kT=0.025eV at 300K) a)43 b)62 c) 93 d) 185 e) 280

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Consider a homogeneously doped n-type semiconductor at 300K. The electron
concentration is equal to 105 cm, n= 10"cm, = 1000 em?/V-sec, ,= 500
cm/V-sec, Tao-2x10's, Tpo=1×10's and the applied electric field is zero. A
light beam in x-direction was applied to the sample resulting excess e-h pair of
2x102 cm at x=0(edge of the sample). Assuming steady state, then hole
diffusion current density at x=20um is .HA/cm?. (use kT=0.025eV at 300K)
a)43
b)62
c) 93
d) 185
e) 280
Transcribed Image Text:Consider a homogeneously doped n-type semiconductor at 300K. The electron concentration is equal to 105 cm, n= 10"cm, = 1000 em?/V-sec, ,= 500 cm/V-sec, Tao-2x10's, Tpo=1×10's and the applied electric field is zero. A light beam in x-direction was applied to the sample resulting excess e-h pair of 2x102 cm at x=0(edge of the sample). Assuming steady state, then hole diffusion current density at x=20um is .HA/cm?. (use kT=0.025eV at 300K) a)43 b)62 c) 93 d) 185 e) 280
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