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3. The Ehrlich-Schoebel barrier in thin-film growth results from (a) a loss of neighbor atoms as an atom is diffusing over a step edge. (b) the activation energy for surface diffusion. (c) the nucleation barrier for monolayer island formation in electrodeposition. (d) the transition barrier in going from layer-by-layer growth to Volmer-Webber growth.

3. The Ehrlich-Schoebel barrier in thin-film growth results from (a) a loss of neighbor atoms as an atom is diffusing over a step edge. (b) the activation energy for surface diffusion. (c) the nucleation barrier for monolayer island formation in electrodeposition. (d) the transition barrier in going from layer-by-layer growth to Volmer-Webber growth.

Introduction to Chemical Engineering Thermodynamics
Introduction to Chemical Engineering Thermodynamics
8th Edition
ISBN:9781259696527
Author:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Publisher:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Chapter1: Introduction
Section: Chapter Questions
Problem 1.1P
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3. The Ehrlich-Schoebel barrier in thin-film growth results from (a) a loss of neighbor atoms as an atom is diffusing over a step edge. (b) the activation energy for surface diffusion. (c) the nucleation barrier for monolayer island formation in electrodeposition. (d) the transition barrier in going from layer-by-layer growth to Volmer-Webber growth.
Transcribed Image Text:3. The Ehrlich-Schoebel barrier in thin-film growth results from (a) a loss of neighbor atoms as an atom is diffusing over a step edge. (b) the activation energy for surface diffusion. (c) the nucleation barrier for monolayer island formation in electrodeposition. (d) the transition barrier in going from layer-by-layer growth to Volmer-Webber growth.
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