-3 = Q2: A metal-semiconductor junction is formed between a metal with a work function of 4.3 eV and p-type silicon with an electron affinity of 4.0 eV. The acceptor doping concentration in the silicon is N=5_10¹ Assume T cm 300 K. (a) Sketch the thermal equilibrium energy-band diagram. (b) Determine the height of the Schottky barrier. (c) Sketch the energy-band diagram with an applied reverse-biased voltage of V₂= 3 V. (d) Sketch the energy-band diagram with an applied forward-bias voltage of R V = 0.25V. a

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Q2: A metal-semiconductor junction is formed between a metal with a work function
of 4.3 eV and p-type silicon with an electron affinity of 4.0 eV. The acceptor doping
concentration in the silicon is N=5 10¹ cm³. Assume T = 300 K. (a) Sketch the
16
a
thermal equilibrium energy-band diagram. (b) Determine the height of the Schottky
barrier. (c) Sketch the energy-band diagram with an applied reverse-biased voltage of
V = 3 V. (d) Sketch the energy-band diagram with an applied forward-bias voltage of
R
V =0.25V.
a
Transcribed Image Text:Q2: A metal-semiconductor junction is formed between a metal with a work function of 4.3 eV and p-type silicon with an electron affinity of 4.0 eV. The acceptor doping concentration in the silicon is N=5 10¹ cm³. Assume T = 300 K. (a) Sketch the 16 a thermal equilibrium energy-band diagram. (b) Determine the height of the Schottky barrier. (c) Sketch the energy-band diagram with an applied reverse-biased voltage of V = 3 V. (d) Sketch the energy-band diagram with an applied forward-bias voltage of R V =0.25V. a
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