-3 = Q2: A metal-semiconductor junction is formed between a metal with a work function of 4.3 eV and p-type silicon with an electron affinity of 4.0 eV. The acceptor doping concentration in the silicon is N=5_10¹ Assume T cm 300 K. (a) Sketch the thermal equilibrium energy-band diagram. (b) Determine the height of the Schottky barrier. (c) Sketch the energy-band diagram with an applied reverse-biased voltage of V₂= 3 V. (d) Sketch the energy-band diagram with an applied forward-bias voltage of R V = 0.25V. a
-3 = Q2: A metal-semiconductor junction is formed between a metal with a work function of 4.3 eV and p-type silicon with an electron affinity of 4.0 eV. The acceptor doping concentration in the silicon is N=5_10¹ Assume T cm 300 K. (a) Sketch the thermal equilibrium energy-band diagram. (b) Determine the height of the Schottky barrier. (c) Sketch the energy-band diagram with an applied reverse-biased voltage of V₂= 3 V. (d) Sketch the energy-band diagram with an applied forward-bias voltage of R V = 0.25V. a
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