Homework Help is Here – Start Your Trial Now!
Math
Statistics
In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C2F flow rate on the uniformity of the etch ona silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations C2F, Flow (SCCM) 2 3 4 5 6. 125 2.5 4.4 2.6 3.2 3.2 4.0 160 4.8 4.4 4.8 4.2 3.6 4.2 200 4.6 3.3 2.8 3.4 4.2 5.3 (a) Does C,F, flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use a = 0.05. There is that flow rate affects etch uniformity. (b) Do the residuals indicate any problems with the underlying assumptions?

In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C2F flow rate on the uniformity of the etch ona silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations C2F, Flow (SCCM) 2 3 4 5 6. 125 2.5 4.4 2.6 3.2 3.2 4.0 160 4.8 4.4 4.8 4.2 3.6 4.2 200 4.6 3.3 2.8 3.4 4.2 5.3 (a) Does C,F, flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use a = 0.05. There is that flow rate affects etch uniformity. (b) Do the residuals indicate any problems with the underlying assumptions?

MATLAB: An Introduction with Applications
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
See similar textbooks
icon
Related questions
Question
Vng exer Cise. In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of CF, flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations CF Flow (SCCM) 1 2 3 4 125 2.5 4.4 2.6 3.2 3.2 4.0 160 4.8 4.4 4.8 4.2 3.6 4.2 200 4.6 3.3 2.8 3.4 4.2 5.3 (a) Does C,F flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use a = 0.05. There is that flow rate affects etch uniformity. (b) Do the evidence e any problems with the underlying assumptions? no evidence
Transcribed Image Text:Vng exer Cise. In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of CF, flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations CF Flow (SCCM) 1 2 3 4 125 2.5 4.4 2.6 3.2 3.2 4.0 160 4.8 4.4 4.8 4.2 3.6 4.2 200 4.6 3.3 2.8 3.4 4.2 5.3 (a) Does C,F flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use a = 0.05. There is that flow rate affects etch uniformity. (b) Do the evidence e any problems with the underlying assumptions? no evidence
In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C2Fe flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations C„F. Flow (SCCM) 2 3 4 5 125 2.5 4.4 2.6 3.2 3.2 4.0 160 4.8 4.4 4.8 4.2 3.6 4.2 200 4.6 3.3 2.8 3.4 4.2 5.3 (a) Does C,F, flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use a = 0.05. There is that flow rate affects etch uniformity. (b) Do the residuals indicate any problems with the underlying assumptions? No. Statistical Tables and Charts Yes.
Transcribed Image Text:In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C2Fe flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations C„F. Flow (SCCM) 2 3 4 5 125 2.5 4.4 2.6 3.2 3.2 4.0 160 4.8 4.4 4.8 4.2 3.6 4.2 200 4.6 3.3 2.8 3.4 4.2 5.3 (a) Does C,F, flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use a = 0.05. There is that flow rate affects etch uniformity. (b) Do the residuals indicate any problems with the underlying assumptions? No. Statistical Tables and Charts Yes.
Expert Solution
trending now

Trending now

This is a popular solution!

steps

Step by step

Solved in 5 steps with 5 images

SEE SOLUTIONCheck out a sample Q&A here
Blurred answer
Similar questions
Recommended textbooks for you
MATLAB: An Introduction with Applications
MATLAB: An Introduction with Applications
Statistics
ISBN:
9781119256830
Author:
Amos Gilat
Publisher:
John Wiley & Sons Inc
Probability and Statistics for Engineering and th…
Probability and Statistics for Engineering and th…
Statistics
ISBN:
9781305251809
Author:
Jay L. Devore
Publisher:
Cengage Learning
Statistics for The Behavioral Sciences (MindTap C…
Statistics for The Behavioral Sciences (MindTap C…
Statistics
ISBN:
9781305504912
Author:
Frederick J Gravetter, Larry B. Wallnau
Publisher:
Cengage Learning
Elementary Statistics: Picturing the World (7th E…
Elementary Statistics: Picturing the World (7th E…
Statistics
ISBN:
9780134683416
Author:
Ron Larson, Betsy Farber
Publisher:
PEARSON
The Basic Practice of Statistics
The Basic Practice of Statistics
Statistics
ISBN:
9781319042578
Author:
David S. Moore, William I. Notz, Michael A. Fligner
Publisher:
W. H. Freeman
Introduction to the Practice of Statistics
Introduction to the Practice of Statistics
Statistics
ISBN:
9781319013387
Author:
David S. Moore, George P. McCabe, Bruce A. Craig
Publisher:
W. H. Freeman
SEE MORE TEXTBOOKS