In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C2F flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations CF Flow (SCCM) 1 2 3

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In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and
D. W. Jillie describe an experiment to determine the effect of C,F. flow rate on the uniformity of the etch on a silicon wafer used in
integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six
replicates is shown below.
Observations
C2F, Flow
(SCCM)
2
3
4
125
2.7 4.6 2.6 3.0 3.2 3.8
160
4.9 4.6 5.0 4.2 3.6 4.2
200
4.6 3.4 2.9 3.5 4.1 5.1
Use Fisher's LSD method with a = 0.05 to analyze the means of the three flow rates.
Choose the correct answer.
O There are significant differences between levels 125 and 160.
O There are significant differences between levels 125 and 200.
O There are significant differences between levels 160 and 200.
O There are significant differences between levels 125 and 160, 160 and 200.
O No significant differences.
Transcribed Image Text:In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C,F. flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. Observations C2F, Flow (SCCM) 2 3 4 125 2.7 4.6 2.6 3.0 3.2 3.8 160 4.9 4.6 5.0 4.2 3.6 4.2 200 4.6 3.4 2.9 3.5 4.1 5.1 Use Fisher's LSD method with a = 0.05 to analyze the means of the three flow rates. Choose the correct answer. O There are significant differences between levels 125 and 160. O There are significant differences between levels 125 and 200. O There are significant differences between levels 160 and 200. O There are significant differences between levels 125 and 160, 160 and 200. O No significant differences.
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