Consider a homogeneously doped n-type semiconductor at 300K. The electron concentration is equal to 105 cm, n= 10"cm³, H,= 1000 cm/V-sec, u,= 500 cm²/V-sec, Tno=2×10's, Tpo=1×10's and the applied electric field is zero. A light beam in x-direction was applied to the sample resulting excess e-h pair of 3×10² cm³ at x-0 (edge of the sample). Assuming steady state, then hole concentration at x=20um is . .×10"cm³. (use kT=0.025eV at 300K) a) b) 3.4 c) 5.1 d) 10.1 e) 15.2

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Consider a homogeneously doped n-type semiconductor at 300K. The electron
concentration is equal to 105 cm³ , n,= 10"cm³, µ,= 1000 cm/V-sec, u,= 500
cm?/V-sec , Tao=2x10's , Tpo=1×107s and the applied electric field is zero. A
light beam in x-direction was applied to the sample resulting excess e-h pair of
3x102 cm at x=0 (edge of the sample) . Assuming steady state, then hole
concentration at x=20µm is . .x10"cm³. (use kT=0.025eV at 300K)
a) 0
b) 3.4
c) 5.1
d) 10.1
e) 15.2
a
O d
e
Transcribed Image Text:Consider a homogeneously doped n-type semiconductor at 300K. The electron concentration is equal to 105 cm³ , n,= 10"cm³, µ,= 1000 cm/V-sec, u,= 500 cm?/V-sec , Tao=2x10's , Tpo=1×107s and the applied electric field is zero. A light beam in x-direction was applied to the sample resulting excess e-h pair of 3x102 cm at x=0 (edge of the sample) . Assuming steady state, then hole concentration at x=20µm is . .x10"cm³. (use kT=0.025eV at 300K) a) 0 b) 3.4 c) 5.1 d) 10.1 e) 15.2 a O d e
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