Calculate the value of Q0

Elements Of Electromagnetics
7th Edition
ISBN:9780190698614
Author:Sadiku, Matthew N. O.
Publisher:Sadiku, Matthew N. O.
ChapterMA: Math Assessment
Section: Chapter Questions
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Phosphorus atoms are to be diffused into a silicon
wafer using both predeposition and drive-in heat treatments; the background
concentration of P in this silicon material is known to be 7.5 x 10^19 atoms/m^3. The
predeposition treatment is to be conducted at 950 degree C for 50 minutes; the
surface concentration of P is to be maintained at a constant level of 2.0 x 10^26 atoms/m^3.
Drive-in diffusion will be carried out at 1200 degree C for a period of 3.0 h.
For the diffusion of P in Si, values of Qd and D0 are 3.40
eV/atom and 1.1 x 10^4  m^2/s, respectively.   Calculate the value of Q0.

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