An important step in many manufacturing processes is the annealing of a material, particularly of metals. A particular manufacturing requires annealing of a thin metallic sheet at 700°C. To accomplish this task, the sheet is placed in a large furnace, the walls of which are at approximately 730°C. An inert gas circulates through the oven to prevent oxidation of the metal. a) The metallic sheet can be approximated as diffuse, and the absorptivity of the sheet is shown below. Using the fact that α = & for a diffuse surface, determine the emissive power (W/m²) from the sheet when it is at a uniform T = 730°C.

An important step in many manufacturing processes is the annealing of a material, particularly of metals. A particular manufacturing requires annealing of a thin metallic sheet at 700°C. To accomplish this task, the sheet is placed in a large furnace, the walls of which are at approximately 730°C. An inert gas circulates through the oven to prevent oxidation of the metal. a) The metallic sheet can be approximated as diffuse, and the absorptivity of the sheet is shown below. Using the fact that α = & for a diffuse surface, determine the emissive power (W/m²) from the sheet when it is at a uniform T = 730°C.

Elements Of Electromagnetics

7th Edition

ISBN:9780190698614

Author:Sadiku, Matthew N. O.

Publisher:Sadiku, Matthew N. O.

ChapterMA: Math Assessment

Section: Chapter Questions

Problem 1.1MA

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Question

An important step in many manufacturing processes is the annealing of a material,
particularly of metals. A particular manufacturing requires annealing of a thin metallic
sheet at 700°C. To accomplish this task, the sheet is placed in a large furnace, the walls of
which are at approximately 730°C. An inert gas circulates through the oven to prevent
oxidation of the metal.
a) The metallic sheet can be approximated as diffuse, and the absorptivity of the sheet
is shown below. Using the fact that a = & for a diffuse surface, determine the
emissive power (W/m²) from the sheet when it is at a uniform T = 730°C.
1
0.8
0.3
2.5
λ (μm)

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