2 Transistors are manufactured by doping semiconductors. The diffusion coefficient of phosphorus in S, is D = 6.5 x 101 em/s at a temperature of 1100°C. Assume the source provides a surface concentration of 1020 atoms/cm and the diffusion time is one hour. Assume that the silicon wafer initially contains no phosphorus. Calculate the depth at which the concentration of phosphorus will be 108 atoms/cm'. Table Tabulation of Error Function Values erfiz) erfiz) 0.9340 0.9523 0.9661 0.55 0.5633 13 0.025 0.60 0.639 14 1.5 0.05 0.0564 0.65 0.6420 0.6778 0.10 0.15 0.20 0.1125 0.70 16 0.9763 0.7112 0.7421 0.1680 0.75 1.7 0.9838 02227 O.80 0.9891 025 0.2763 0.7707 19 0.9928 0.30 0.35 0.40 0.3286 0.3794 0.90 0.7970 2.0 0.9953 0.95 1.0 1.1 12 OR209 0.8427 2.2 2.4 2.6 2.8 0.9981 0.4284 0.4755 0.9993 0.45 0.9098 050 0.S205 0.9103 0.9999
2 Transistors are manufactured by doping semiconductors. The diffusion coefficient of phosphorus in S, is D = 6.5 x 101 em/s at a temperature of 1100°C. Assume the source provides a surface concentration of 1020 atoms/cm and the diffusion time is one hour. Assume that the silicon wafer initially contains no phosphorus. Calculate the depth at which the concentration of phosphorus will be 108 atoms/cm'. Table Tabulation of Error Function Values erfiz) erfiz) 0.9340 0.9523 0.9661 0.55 0.5633 13 0.025 0.60 0.639 14 1.5 0.05 0.0564 0.65 0.6420 0.6778 0.10 0.15 0.20 0.1125 0.70 16 0.9763 0.7112 0.7421 0.1680 0.75 1.7 0.9838 02227 O.80 0.9891 025 0.2763 0.7707 19 0.9928 0.30 0.35 0.40 0.3286 0.3794 0.90 0.7970 2.0 0.9953 0.95 1.0 1.1 12 OR209 0.8427 2.2 2.4 2.6 2.8 0.9981 0.4284 0.4755 0.9993 0.45 0.9098 050 0.S205 0.9103 0.9999
College Physics
11th Edition
ISBN:9781305952300
Author:Raymond A. Serway, Chris Vuille
Publisher:Raymond A. Serway, Chris Vuille
Chapter1: Units, Trigonometry. And Vectors
Section: Chapter Questions
Problem 1CQ: Estimate the order of magnitude of the length, in meters, of each of the following; (a) a mouse, (b)...
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Transistors are manufactured by doping semiconductors. The diffusion coefficient of phosphorus in Si is D = 6.5 x 10-11 mm2/s at a temperature of 950°C. Assume the source provides a surface concentration of
1020 atoms/cm3 and the diffusion time is one hour. Assume that the silicon wafer initially contains no phosphorus. Calculate the depth at which the concentration of phosphorus will be 1018 atoms/cm3.
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