1. For a p-substrate silicon n-MOS capacitor at T = 300 K, the substrate doping is NA = 4.55 x 1016/cm³. Value of n; at T = 300 K is 1.5 x 1010 / cm³. %3D (iii) For (Pm = 4.32 eV and x = 4.01 eV, what is the flat band voltage VFB (V)? EG In ) VrB = Pm - (x + + ¢a) ´N A + PB kT Pm – (x - %3D PB (iv) Find the maximum depletion width xpT (um) when the surface is inverted.
1. For a p-substrate silicon n-MOS capacitor at T = 300 K, the substrate doping is NA = 4.55 x 1016/cm³. Value of n; at T = 300 K is 1.5 x 1010 / cm³. %3D (iii) For (Pm = 4.32 eV and x = 4.01 eV, what is the flat band voltage VFB (V)? EG In ) VrB = Pm - (x + + ¢a) ´N A + PB kT Pm – (x - %3D PB (iv) Find the maximum depletion width xpT (um) when the surface is inverted.
Introductory Circuit Analysis (13th Edition)
13th Edition
ISBN:9780133923605
Author:Robert L. Boylestad
Publisher:Robert L. Boylestad
Chapter1: Introduction
Section: Chapter Questions
Problem 1P: Visit your local library (at school or home) and describe the extent to which it provides literature...
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