fter photolithography process the wafer will go to the either etching process or doping process such as ion implantation and diffusion. * True or False

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9. After following all the steps in the photolithography, a student found that all the photoresist (the exposed and unexposed photoresist) on the silicon wafer was washed away during the development step. This is due to... *

A) the student used longer exposure time during alignment and exposure step

B) the student used slower spin speed during spin coating producing thicker photoresists

C) the student used longer development time during the development step

D) the student used lower temperature and shorter baking time during the pre bake step

E) the student misaligned the mask with the wafer during the alignment step

10. After photolithography process the wafer will go to the either etching process or doping process such as ion implantation and diffusion. *

True or False

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