For an n-channel silicon MOSFET with 10 nm gate oxide thickness, the substrate he is found to be 50 mV/N at a substrate voltage |Vas=2V, where sensitivity a Ves V, is the threshold voltage of the MOSFET. Assume that, Ves|> 20g, where qdg is the separation between the Fermi energy level E, and the intrinsic level E, in the bulk.

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For an n-channel silicon MOSFET with 10 nm gate oxide thickness, the substrate
av
is found to be 50 mV/V at a substrate voltage |Vas|=2V, where
al Ves
sensitivity
V, is the threshold voltage of the MOSFET. Assume that, Ves|>> 20B, where q, is
the separation between the Fermi energy level E; and the intrinsic level E, in the bulk.
Parameters given are
Electron charge (q) = 1.6 x 10 19 c
Vacuum permittivity (e) = 8.85 x 10-12 F/m
Relative permittivity of silicon (e)
Relative permittivity of oxide (e ) = 4
12
%3D
The doping concentration of the substrate is
(a) 4.37 x 1015 cm 3
(c) 9.37 x 1015 cm-3
(b) 7.37 x 1015 cm 3
(d) 2.37 x 1015 cm3
Transcribed Image Text:For an n-channel silicon MOSFET with 10 nm gate oxide thickness, the substrate av is found to be 50 mV/V at a substrate voltage |Vas|=2V, where al Ves sensitivity V, is the threshold voltage of the MOSFET. Assume that, Ves|>> 20B, where q, is the separation between the Fermi energy level E; and the intrinsic level E, in the bulk. Parameters given are Electron charge (q) = 1.6 x 10 19 c Vacuum permittivity (e) = 8.85 x 10-12 F/m Relative permittivity of silicon (e) Relative permittivity of oxide (e ) = 4 12 %3D The doping concentration of the substrate is (a) 4.37 x 1015 cm 3 (c) 9.37 x 1015 cm-3 (b) 7.37 x 1015 cm 3 (d) 2.37 x 1015 cm3
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