Consider an NMOS transistor fabricated in a 0.18-µm process with L = 0.18 µm and W = 2 µm. The process technology is specified to have C = 8.6 fF/µm², µ, =450 cm/V. s, and V = 0.5 V. ох (a) Find Ves and Vps that result in the MOSFET operating at the edge of saturation with I, = 100 µ A. %3|

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Consider an NMOS transistor fabricated in a 0.18-µm process with L = 0.18 µm and W = 2 µm. The
process technology is specified to have C = 8.6 fF/um", u,
= 450 cm/V. s, and V,=0.5 V.
(a) Find Vcs and Vps that result in the MOSFET operating at the edge of saturation with I, = 100 µ A.
Transcribed Image Text:Consider an NMOS transistor fabricated in a 0.18-µm process with L = 0.18 µm and W = 2 µm. The process technology is specified to have C = 8.6 fF/um", u, = 450 cm/V. s, and V,=0.5 V. (a) Find Vcs and Vps that result in the MOSFET operating at the edge of saturation with I, = 100 µ A.
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