FET Pot-Pourri. Refer to the generic FET figure for this problem. If the substrate doping is N = 5 x 1016 cm³, the basic structure is (CMOS, PMOS, NMOS, JFET, MESFET) and the inverted channel charge carriers are (HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS). Metal Silicon dioxide (SIO2) (or polysilicon) S G Channel region p-type substrate (body) Source (b) If the substrate doping is changed to be N, = 5 x 10“ cm³, region Drain region the basic structure is (CMOS, PMOS, NMOS, JFET, MESFET) and the inverted channel charge carriers are (HOLES, В ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS) Assume L= 50 nm, W = 500 nm, t = 200 Ă. Units are important!!!!!! %3D c) Compute Cox Compute CTotal

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# FET Pot-Pourri Educational Resource

## Refer to the Generic FET Figure for This Problem

### Diagram Explanation
The diagram represents a Field Effect Transistor (FET) structure. Key components are:
- **Source and Drain Regions (n+):** Heavily doped areas where carriers enter and exit.
- **Channel Region (L):** The path between source and drain where current flows.
- **Gate (G):** Controls the channel conductivity via an applied voltage.
- **Silicon Dioxide (SiO₂):** An insulating layer that separates the gate from the channel.
- **Body or Substrate (p-type):** Usually the base material, which influences the type of carriers.

### Questions and Parameters
#### (a)
**Problem:** If the substrate doping is \( N_A = 5 \times 10^{16} \, \text{cm}^{-3} \), determine:
- **Basic Structure:** Choose from (CMOS, PMOS, NMOS, JFET, MESFET)
- **Inverted Channel Charge Carriers:** Select from (HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS).

#### (b)
**Problem:** If the substrate doping changes to \( N_D = 5 \times 10^{16} \, \text{cm}^{-3} \), determine:
- **Basic Structure:** Choose from (CMOS, PMOS, NMOS, JFET, MESFET)
- **Inverted Channel Charge Carriers:** Select from (HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS).

#### (c)
**Task:** Assume \( L = 50 \, \text{nm}, W = 500 \, \text{nm}, t_{ox} = 200 \, \text{Å} \). **Units are important!**
- **Compute \( C_{ox} \):** __________________
- **Compute \( C_{Total} \):** __________________

Note: \( C_{ox} \) refers to the oxide capacitance, and \( C_{total} \) is the total capacitance in the given setup.
Transcribed Image Text:# FET Pot-Pourri Educational Resource ## Refer to the Generic FET Figure for This Problem ### Diagram Explanation The diagram represents a Field Effect Transistor (FET) structure. Key components are: - **Source and Drain Regions (n+):** Heavily doped areas where carriers enter and exit. - **Channel Region (L):** The path between source and drain where current flows. - **Gate (G):** Controls the channel conductivity via an applied voltage. - **Silicon Dioxide (SiO₂):** An insulating layer that separates the gate from the channel. - **Body or Substrate (p-type):** Usually the base material, which influences the type of carriers. ### Questions and Parameters #### (a) **Problem:** If the substrate doping is \( N_A = 5 \times 10^{16} \, \text{cm}^{-3} \), determine: - **Basic Structure:** Choose from (CMOS, PMOS, NMOS, JFET, MESFET) - **Inverted Channel Charge Carriers:** Select from (HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS). #### (b) **Problem:** If the substrate doping changes to \( N_D = 5 \times 10^{16} \, \text{cm}^{-3} \), determine: - **Basic Structure:** Choose from (CMOS, PMOS, NMOS, JFET, MESFET) - **Inverted Channel Charge Carriers:** Select from (HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS). #### (c) **Task:** Assume \( L = 50 \, \text{nm}, W = 500 \, \text{nm}, t_{ox} = 200 \, \text{Å} \). **Units are important!** - **Compute \( C_{ox} \):** __________________ - **Compute \( C_{Total} \):** __________________ Note: \( C_{ox} \) refers to the oxide capacitance, and \( C_{total} \) is the total capacitance in the given setup.
Expert Solution
Step 1

Given the internal structure of FET:

Electrical Engineering homework question answer, step 1, image 1

a) If the substrate doping is NA = 5 x 1016 cm-3, then we need to find what is the basic structure out of the options( (CMOS, PMOS, NMOS, JFET, MESFET) and also we need to find the inverted channel charge carrier out of the options(HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS).

b)  If the substrate doping is changed to be ND = 5 x 1016 cm-3, then we need to find what is the basic structure out of the options( (CMOS, PMOS, NMOS, JFET, MESFET) and also we need to find the inverted channel charge carrier out of the options(HOLES, ELECTRONS, BOTH HOLES AND ELECTRONS, NEUTRONS, PHOTONS).

c) Assuming L = 50 nm, W = 500 nm, tox = 200 Å. We need to compute Cox and CTotal.

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