An ideal rectifying contact is formed by depositing gold on n-type silicon doped at 1015 cm-3. At T = 300 K, determine the width of the depletion region. W = 9.540 X 10-4 cm W = 2.244 X 10-4 cm W = 1.033 X 10-4 cm OW = 4.151 X 10-4 cm
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- 3. Consider the following parameters in a silicon pn junction at T = 300 K. Nd 1 x 1016 cm-³ Dn = 25 cm²/s ™n = 2 μs Na = 2 x 1016 cm-³ Dp = 10 cm²/s Tp = 1 μs ni = 1.5 x 1010 cm-3 Er = 11.7 Eo = 8.85 x 10-12 F/mAt 23° K, the crystal structure transforms from BCC to HCP keeping density same. The 0 cubic face in BCC is a = 3.42 A and in HCP is == 1.53. The lattice constant in HCP a structure is, 0 (a) 2.64 A 0 (b) 3.16 A 0 (c) 2.16 A 0 (d) 2.42 A(a) How many silicon atoms are there in each unit cell? (b) How many silicon atoms are there in one cubic centimeter? (c) Knowing that the length of a side of the unit cell (the silicon lattice constant) is 5.43 Å, Si atomic weight is 28.1, and the Avogdaro's number is 6.02 × 10²3 atoms/mole, find the silicon density in g/cm³.
- Needs Complete solution with 100 % accuracy don't use chat gpt or ai plz plz plz plz plz pleaseQ1/Determine the temperature at which there is a 2 percent that an energy state 0.3 eV below the Fermi level is empty? Q2/ Determine the temperature at which there is a 3 percent that an energy state 0.3 eV below the Fermi level is empty?Q3:- A bar of p-type silicon, has a cross-sectional area A = 10.6 em2 and a length L= 1.2x10 cm. For an applied voltage of 4 V, a current of 3 mA is required. What is the required (a) resistance, (b) resistivity, and te) Impurity doping concentration? td) What is the resulting hole mobility
- The energy of formation of a vacancy in copper is 1.03 eV. Estimate the relative change in the density of copper due to vacancy formation from 1050 K to 1350 K. Explain possible reason(s) for such changeFor a 40 wt.% Sn60 wt.% Pb alloy at 150\deg C, (a) what phase(s) is (are) present? (b) What is (are) the composition(s) of the phase(s)? (c) What is (are) the relative amount of the phase(s) in terms of mass fraction?When a metal is heated, its atoms vibrate more about their position in the lattice (a network of crossed bars). This causes them to take up more space, so the solid metal expands from its original shape. Calculate the heat needed to expand a ring made of copper with an internal diameter of 50mm to fit over a shaft of diameter 50.05mm. The shaft is measured at a temperature 20 degrees c
- ionic conductivity of a dication is 8.0 mS m2 mol-1.how to calculate the diffusion coefficient of the dication at a temperature of 320 K? answer in cm2 s-1(Electroplating) A steel part with surface area A = 130 cm² is to be tin-plated. What average plating thickness will result if 15 amps are applied for 10 min in an acid sulfate electrolyte bath? The cathode efficiency for tin is E = 90% and the plating constant C = 4.21 x 10-2 mm³/amp-s. V = CIt V = ECIt d = V A Typical cathode efficiencies in electroplating and values of plating constant C. Compiled from [18]. Plate Metal Electrolyte Cadmium (2) Cyanide Chromium (3) Chromium-acid-sulfate Copper (1) Gold (1) Nickel (2) Silver (1) Tin (4) Zinc (2) Cyanide Cyanide Acid sulfate Cyanide Acid sulfate Chloride Plating Constant ca Cathode Efficiency % mm³/amp-s (in³/amp-min) 6.73 × 10-² (2.47 × 10-4) X 2.50 × 10-2 (0.92 × 10-4) 7.35 x 10-2 10.6 x 10-² 3.42 x 10-2 (2.69 × 10-4) (3.87 × 10-4) (1.25 × 10-4) 10.7 x 10-2 (3.90 × 10-4) 4.21 x 10-2 (1.54 × 10-4) 4.75 × 10-2 (1.74 x 10-4) 90 15 98 80 95 100 90 95 ¹Most common valence given in parentheses (); this is the value assumed in determining…