3. In a particular semiconductor device, an oxide layer forms a barrier 0.6 nm wide and 9V high between two conducting wires. An electron beam is accelerated through a 4V potential so that each electron approach the barrier with an energy of 4 eV. (a) What percent of the incident electrons will tunnel through the barrier? (b) Is aa for this system much larger than one, much less than one, or the same order of magnitude as one? Can we approximate the transmission coefficient using the formula below? = 16 (1-2) e- E Vo T= -2aa (1) (c) Find the transmission coefficient using Eq. 1 and compare with your answer from part (a). Was Eq. 1 a good approximation?

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**Transcription for Educational Website**

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### Problem 3: Quantum Tunneling in a Semiconductor Device

In a particular semiconductor device, an oxide layer forms a barrier 0.6 nm wide and 9V high between two conducting wires. An electron beam is accelerated through a 4V potential so that each electron approaches the barrier with an energy of 4 eV.

#### (a) Calculation Task:
What percent of the incident electrons will tunnel through the barrier?

#### (b) Analysis Task:
Is \( \alpha a \) for this system much larger than one, much less than one, or the same order of magnitude as one? Can we approximate the transmission coefficient using the formula below?

\[
T = 16 \frac{E}{V_0} \left(1 - \frac{E}{V_0}\right) e^{-2\alpha a} \quad \text{(1)}
\]

#### (c) Application Task:
Find the transmission coefficient using Eq. 1 and compare with your answer from part (a). Was Eq. 1 a good approximation?

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#### Explanation of Formula (Eq. 1):
This formula provides the transmission coefficient \( T \) for an electron tunneling through a potential barrier, where \( E \) is the electron's energy, \( V_0 \) is the barrier potential, \( \alpha \) is a constant derived from the system properties, and \( a \) is the width of the barrier. The equation helps determine the probability of electron tunneling based on these parameters.
Transcribed Image Text:**Transcription for Educational Website** --- ### Problem 3: Quantum Tunneling in a Semiconductor Device In a particular semiconductor device, an oxide layer forms a barrier 0.6 nm wide and 9V high between two conducting wires. An electron beam is accelerated through a 4V potential so that each electron approaches the barrier with an energy of 4 eV. #### (a) Calculation Task: What percent of the incident electrons will tunnel through the barrier? #### (b) Analysis Task: Is \( \alpha a \) for this system much larger than one, much less than one, or the same order of magnitude as one? Can we approximate the transmission coefficient using the formula below? \[ T = 16 \frac{E}{V_0} \left(1 - \frac{E}{V_0}\right) e^{-2\alpha a} \quad \text{(1)} \] #### (c) Application Task: Find the transmission coefficient using Eq. 1 and compare with your answer from part (a). Was Eq. 1 a good approximation? --- #### Explanation of Formula (Eq. 1): This formula provides the transmission coefficient \( T \) for an electron tunneling through a potential barrier, where \( E \) is the electron's energy, \( V_0 \) is the barrier potential, \( \alpha \) is a constant derived from the system properties, and \( a \) is the width of the barrier. The equation helps determine the probability of electron tunneling based on these parameters.
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