3. An aluminum thin film is deposited onto an 8" diameter silicon wafer by thermal evaporation from a crucible cup (it can only evaporate upwards and so it will coat a hemispherical shell above the crucible). The crucible has a diameter 1 cm, and the wafer is positioned directly over it with 0° angular tilt. Deposition occurs at 1.5 × 10-6 Torr. a) The thickness of the aluminum is measured to be 0.5 µm at the centre of the silicon wafer. The thickness at the edge of the wafer is 0.3 µm. Calculate the distance of the wafer from the crucible source? b) What is the rate of aluminum deposition onto the wafer, at the center of the wafer, if the deposition is done at 1100°C? Use aluminum density of 2.7 g/cm³.

Elements Of Electromagnetics
7th Edition
ISBN:9780190698614
Author:Sadiku, Matthew N. O.
Publisher:Sadiku, Matthew N. O.
ChapterMA: Math Assessment
Section: Chapter Questions
Problem 1.1MA
icon
Related questions
Question
Please solve asap.
3. An aluminum thin film is deposited onto an 8" diameter silicon wafer by thermal
evaporation from a crucible cup (it can only evaporate upwards and so it will coat a
hemispherical shell above the crucible). The crucible has a diameter 1 cm, and the wafer is
positioned directly over it with 0° angular tilt. Deposition occurs at 1.5 × 10-6 Torr.
a) The thickness of the aluminum is measured to be 0.5 um at the centre of the silicon wafer.
The thickness at the edge of the wafer is 0.3 µm. Calculate the distance of the wafer from
the crucible source?
b) What is the rate of aluminum deposition onto the wafer, at the center of the wafer, if the
deposition is done at 1100°C? Use aluminum density of 2.7 g/cm³.
c) Will this evaporation processes result in good quality aluminum, and if not, how might you
improve it? Justify your answer.
Transcribed Image Text:3. An aluminum thin film is deposited onto an 8" diameter silicon wafer by thermal evaporation from a crucible cup (it can only evaporate upwards and so it will coat a hemispherical shell above the crucible). The crucible has a diameter 1 cm, and the wafer is positioned directly over it with 0° angular tilt. Deposition occurs at 1.5 × 10-6 Torr. a) The thickness of the aluminum is measured to be 0.5 um at the centre of the silicon wafer. The thickness at the edge of the wafer is 0.3 µm. Calculate the distance of the wafer from the crucible source? b) What is the rate of aluminum deposition onto the wafer, at the center of the wafer, if the deposition is done at 1100°C? Use aluminum density of 2.7 g/cm³. c) Will this evaporation processes result in good quality aluminum, and if not, how might you improve it? Justify your answer.
Expert Solution
trending now

Trending now

This is a popular solution!

steps

Step by step

Solved in 2 steps

Blurred answer
Knowledge Booster
Dimensional Analysis
Learn more about
Need a deep-dive on the concept behind this application? Look no further. Learn more about this topic, mechanical-engineering and related others by exploring similar questions and additional content below.
Recommended textbooks for you
Elements Of Electromagnetics
Elements Of Electromagnetics
Mechanical Engineering
ISBN:
9780190698614
Author:
Sadiku, Matthew N. O.
Publisher:
Oxford University Press
Mechanics of Materials (10th Edition)
Mechanics of Materials (10th Edition)
Mechanical Engineering
ISBN:
9780134319650
Author:
Russell C. Hibbeler
Publisher:
PEARSON
Thermodynamics: An Engineering Approach
Thermodynamics: An Engineering Approach
Mechanical Engineering
ISBN:
9781259822674
Author:
Yunus A. Cengel Dr., Michael A. Boles
Publisher:
McGraw-Hill Education
Control Systems Engineering
Control Systems Engineering
Mechanical Engineering
ISBN:
9781118170519
Author:
Norman S. Nise
Publisher:
WILEY
Mechanics of Materials (MindTap Course List)
Mechanics of Materials (MindTap Course List)
Mechanical Engineering
ISBN:
9781337093347
Author:
Barry J. Goodno, James M. Gere
Publisher:
Cengage Learning
Engineering Mechanics: Statics
Engineering Mechanics: Statics
Mechanical Engineering
ISBN:
9781118807330
Author:
James L. Meriam, L. G. Kraige, J. N. Bolton
Publisher:
WILEY