Concept explainers
Videos
BIO Power lines—do their magnetic fields pose a risk? Power lines produce both electric and magnetic fields The interior of the human body is an electrical conductor, and as a result, electric fields are greatly reduced in magnitude within the body The electric fields inside the body from power lines are much smaller than electric fields normally existing in the body.
However, magnetic fields are not reduced in the body Earth's magnetic field, approximately
T, is very small and not regarded as a health threat Thus, it is interesting to compare Earth's magnetic field to fields produced by high power lines The magnetic field B produced at a distance r from a straight wire with an
The magnetic field from a high-voltage power line located 40 m above the ground carrying a 100-A current is much smaller than Earth's
Wires that provide electric power for household appliances also produce electric and magnetic fields The current in the wire for a 500-W space heater is about 5 A. With the wire located several meters from your body the magnetic field of such an appliance is somewhat smaller than Earth s magnetic field By comparison laboratory mice lived for several generations in 0.0010-T magnetic fields (20 times Earth s magnetic field) without any adverse effects.
During the last three decades, electric power use has increased the magnitudes of the
A 550-W toaster oven is connected to a 110-V wall outlet. Which answer below is closest to the electric current in one of the wires from the wall outlet to the oven?
a. 0.2 A
b. 50,000 A
c. 1 A
d. 5 A
e. 20 A
Want to see the full answer?
Check out a sample textbook solution
Chapter 20 Solutions
College Physics
Additional Science Textbook Solutions
Laboratory Experiments in Microbiology (12th Edition) (What's New in Microbiology)
Anatomy & Physiology (6th Edition)
Campbell Biology: Concepts & Connections (9th Edition)
Microbiology: An Introduction
Applications and Investigations in Earth Science (9th Edition)
Microbiology with Diseases by Body System (5th Edition)
- 12. If all three collisions in the figure below are totally inelastic, which will cause more damage? (think about which collision has a larger amount of kinetic energy dissipated/lost to the environment? I m II III A. I B. II C. III m m v brick wall ע ע 0.5v 2v 0.5m D. I and II E. II and III F. I and III G. I, II and III (all of them) 2marrow_forwardCan you solve this 2 question teach me step by step and draw for mearrow_forwardFrom this question and answer can you explain how get (0,0,5) and (5,0,,0) and can you teach me how to solve thisarrow_forward
- Can you solve this 2 question and teach me using ( engineer method formula)arrow_forward11. If all three collisions in the figure below are totally inelastic, which brings the car of mass (m) on the left to a halt? I m II III m m ע ע ע brick wall 0.5v 2m 2v 0.5m A. I B. II C. III D. I and II E. II and III F. I and III G. I, II and III (all of them)arrow_forwardHow can you tell which vowel is being produced here ( “ee,” “ah,” or “oo”)? Also, how would you be able to tell for the other vowels?arrow_forward
- You want to fabricate a soft microfluidic chip like the one below. How would you go about fabricating this chip knowing that you are targeting a channel with a square cross-sectional profile of 200 μm by 200 μm. What materials and steps would you use and why? Disregard the process to form the inlet and outlet. Square Cross Sectionarrow_forward1. What are the key steps involved in the fabrication of a semiconductor device. 2. You are hired by a chip manufacturing company, and you are asked to prepare a silicon wafer with the pattern below. Describe the process you would use. High Aspect Ratio Trenches Undoped Si Wafer P-doped Si 3. You would like to deposit material within a high aspect ratio trench. What approach would you use and why? 4. A person is setting up a small clean room space to carry out an outreach activity to educate high school students about patterning using photolithography. They obtained a positive photoresist, a used spin coater, a high energy light lamp for exposure and ordered a plastic transparency mask with a pattern on it to reduce cost. Upon trying this set up multiple times they find that the full resist gets developed, and they are unable to transfer the pattern onto the resist. Help them troubleshoot and find out why pattern of transfer has not been successful. 5. You are given a composite…arrow_forwardTwo complex values are z1=8 + 8i, z2=15 + 7 i. z1∗ and z2∗ are the complex conjugate values. Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for (z1-z∗2)/z1+z2∗. Find r and θ for (z1−z2∗)z1z2∗ Please show all stepsarrow_forward
- An electromagnetic wave is traveling through vacuum in the positive x direction. Its electric field vector is given by E=E0sin(kx−ωt)j^,where j^ is the unit vector in the y direction. If B0 is the amplitude of the magnetic field vector, find the complete expression for the magnetic field vector B→ of the wave. What is the Poynting vector S(x,t), that is, the power per unit area associated with the electromagnetic wave described in the problem introduction? Give your answer in terms of some or all of the variables E0, B0, k, x, ω, t, and μ0. Specify the direction of the Poynting vector using the unit vectors i^, j^, and k^ as appropriate. Please explain all stepsarrow_forwardAnother worker is performing a task with an RWL of only 9 kg and is lifting 18 kg, giving him an LI of 2.0 (high risk). Questions:What is the primary issue according to NIOSH?Name two factors of the RWL that could be improved to reduce risk.If the horizontal distance is reduced from 50 cm to 30 cm, how does the HM change and what effect would it have?arrow_forwardTwo complex values are z1=8 + 8i, z2=15 + 7 i. z1∗ and z2∗ are the complex conjugate values. Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for z1z2∗. Find r and θ for z1/z2∗? Find r and θ for (z1−z2)∗/z1+z2∗. Find r and θ for (z1−z2)∗/z1z2∗ Please explain all steps, Thank youarrow_forward
College PhysicsPhysicsISBN:9781938168000Author:Paul Peter Urone, Roger HinrichsPublisher:OpenStax College
Physics for Scientists and Engineers, Technology ...PhysicsISBN:9781305116399Author:Raymond A. Serway, John W. JewettPublisher:Cengage Learning
Physics for Scientists and Engineers: Foundations...PhysicsISBN:9781133939146Author:Katz, Debora M.Publisher:Cengage Learning
College PhysicsPhysicsISBN:9781305952300Author:Raymond A. Serway, Chris VuillePublisher:Cengage Learning
College PhysicsPhysicsISBN:9781285737027Author:Raymond A. Serway, Chris VuillePublisher:Cengage Learning