Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. The data are as follows: Etch Uniformity 5.34 6.65 4.76 5.98 7.25 6.00 7.55 5.54 5.62 6.21 5.97 7.35 5.44 4.39 4.98 5.25 6.35 4.61 6.00 5.32 (a) Construct a 95 percent confidence interval estimate of s2. (b) Test the hypothesis that 2= 1.0. Use a = 0.05. What are your conclusions?
Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. The data are as follows: Etch Uniformity 5.34 6.65 4.76 5.98 7.25 6.00 7.55 5.54 5.62 6.21 5.97 7.35 5.44 4.39 4.98 5.25 6.35 4.61 6.00 5.32 (a) Construct a 95 percent confidence interval estimate of s2. (b) Test the hypothesis that 2= 1.0. Use a = 0.05. What are your conclusions?
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
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Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. The data are as follows:
Etch Uniformity |
||||
5.34 |
6.65 |
4.76 |
5.98 |
7.25 |
6.00 |
7.55 |
5.54 |
5.62 |
6.21 |
5.97 |
7.35 |
5.44 |
4.39 |
4.98 |
5.25 |
6.35 |
4.61 |
6.00 |
5.32 |
(a) Construct a 95 percent confidence
(b) Test the hypothesis that 2= 1.0. Use a = 0.05. What are your conclusions?
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