Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher.  The data are as follows:   Etch Uniformity 5.34 6.65 4.76 5.98 7.25 6.00 7.55 5.54 5.62 6.21 5.97 7.35 5.44 4.39 4.98 5.25 6.35 4.61 6.00 5.32 (a)  Construct a 95 percent confidence interval estimate of s2. (b) Test the hypothesis that 2= 1.0.  Use a = 0.05.  What are your conclusions?

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Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher.  The data are as follows:  

Etch Uniformity

5.34

6.65

4.76

5.98

7.25

6.00

7.55

5.54

5.62

6.21

5.97

7.35

5.44

4.39

4.98

5.25

6.35

4.61

6.00

5.32

(a)  Construct a 95 percent confidence interval estimate of s2.

(b) Test the hypothesis that 2= 1.0.  Use a = 0.05.  What are your conclusions?

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