In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metallization. The etch rate is an important characteristic in this process. Two different etching solutions have been compared, using two random samples of 9 wafers for each solution. The observed etch rates are as follows: Solution 1 9.9 10.6 10.3 9.4 9.3 10.0 9.6 10.3 10.2 Solution 2 10.2 10.6 10.5 10.7 10.6 10.2 10.5 9.8 10.6 Can it be concluded at the a = 0.05 level that the solutions are different?
In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metallization. The etch rate is an important characteristic in this process. Two different etching solutions have been compared, using two random samples of 9 wafers for each solution. The observed etch rates are as follows: Solution 1 9.9 10.6 10.3 9.4 9.3 10.0 9.6 10.3 10.2 Solution 2 10.2 10.6 10.5 10.7 10.6 10.2 10.5 9.8 10.6 Can it be concluded at the a = 0.05 level that the solutions are different?
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
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