In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization The etch rate is an important characteristic in this process and known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are a follows (in mils per minute): Solution 1 9.6 10.2 9.4 10.3 9.3 9.6 10.0 Solution 2 10.2 10.1 10.3 10.1 10.6 10.2 10.7 10.7 10.3 10.4 10.4 10.5 10.3 (a) Calculate the sample mean for solution 1:₁ = 98.76). i (b) Calculate the sample standard deviation for solution 1: s₁ - = i Round your answer to two decimal places (e.g. Round your answer to three decimal

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(c) Calculate the sample mean for solution 2:2 =
98.76).
(d) Calculate the sample standard deviation for solution 2: s₁ = i
places (e.g. 98.765).
i
(e) Test the hypothesis Ho: M₁ = M₂ VS H₁: M₁ M₂.
Calculate to =
Round your answer to two decimal places (e.g.
Round your answer to two decimal places (e.g. 98.76).
(Calculate using the following order:₁-₂)
(i
98.765).
(f) Do the data support the claim that the mean etch rate is different for the two solutions? Use α = 0.05.
(g) Calculate a 95% two-sided confidence interval on the difference in mean etch rate.
≤ M₁-M₂ ≤ i
Round your answer to three decimal
) Round your answers to three decimal places (e.g.
Transcribed Image Text:(c) Calculate the sample mean for solution 2:2 = 98.76). (d) Calculate the sample standard deviation for solution 2: s₁ = i places (e.g. 98.765). i (e) Test the hypothesis Ho: M₁ = M₂ VS H₁: M₁ M₂. Calculate to = Round your answer to two decimal places (e.g. Round your answer to two decimal places (e.g. 98.76). (Calculate using the following order:₁-₂) (i 98.765). (f) Do the data support the claim that the mean etch rate is different for the two solutions? Use α = 0.05. (g) Calculate a 95% two-sided confidence interval on the difference in mean etch rate. ≤ M₁-M₂ ≤ i Round your answer to three decimal ) Round your answers to three decimal places (e.g.
In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization.
The etch rate is an important characteristic in this process and known to follow a normal distribution. Two different etching solutions
have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as
follows (in mils per minute):
Solution 1
9.6 10.2
9.4
9.3
9.6
10.3
10.0
Solution 2
10.2 10.1
10.3 10.1
10.6 10.2
10.7 10.7
10.3 10.4 10.4
10.5 10.3
(a) Calculate the sample mean for solution 1:₁
98.76).
i
(b) Calculate the sample standard deviation for solution 1: s₁ =
places (e.g. 98.765).
Round your answer to two decimal places (e.g.
Round your answer to three decimal
Transcribed Image Text:In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 9.6 10.2 9.4 9.3 9.6 10.3 10.0 Solution 2 10.2 10.1 10.3 10.1 10.6 10.2 10.7 10.7 10.3 10.4 10.4 10.5 10.3 (a) Calculate the sample mean for solution 1:₁ 98.76). i (b) Calculate the sample standard deviation for solution 1: s₁ = places (e.g. 98.765). Round your answer to two decimal places (e.g. Round your answer to three decimal
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