side a bell jar, and chemical vapors are introduced. The susceptor is rotated and heat is applied until the epitaxial layer is thick enough. An experiment was run using two factors: arsenic flow rate (A) and deposition time (B). Four r
side a bell jar, and chemical vapors are introduced. The susceptor is rotated and heat is applied until the epitaxial layer is thick enough. An experiment was run using two factors: arsenic flow rate (A) and deposition time (B). Four r
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
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please show the complete process and solution (minitab)
A basic processing step is to grow an epitaxial layer on polished silicon wafers. The wafers mounted on a susceptor are positioned inside a bell jar, and chemical vapors are introduced. The susceptor is rotated and heat is applied until the epitaxial layer is thick enough. An experiment was run using two factors: arsenic flow rate (A) and deposition time (B). Four replicates were run, and the epitaxial layer thickness was measured (in mm). The data are shown below:
Replicates
|
factors |
Levels
|
||||||
A
|
B
|
I
|
II
|
III
|
IV
|
Low (-)
|
High (+) | |
-
|
-
|
14.037
|
16.165
|
13.972
|
13.907
|
A
|
55%
|
59%
|
+
|
-
|
13.88
|
13.86
|
14.032
|
13.914
|
|||
-
|
+
|
14.821
|
14.757
|
14.843
|
14.878
|
B
|
Short
|
Long
|
+
|
+
|
14.888
|
14.921
|
14.415
|
14.932
|
(10mins)
|
(15mins)
|
- Which effects appear to be large? Use the analysis of variance to confirm your conclusions.
- Provide the regression model based on the results of this experiment.
Ftable(α=0.1) = 3.17655
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