In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 Solution 2 9.8 10.2 10.3 10.6 9.4 10.3 10.6 10.2 9.3 10.0 10.7 10.7 9.6 10.3 10.4 10.4 10.2 10.1 10.5 10.3 (a) Calculate the sample mean for solution 1:x1 = 3.632 Round your answer to two decimal places (e.g. 98.76). (b) Calculate the sample standard deviation for solution 1: s1 = i Round your answer to three decimal places (e.g. 98.765). (c) Calculate the sample mean for solution 2:2 = Round your answer to two decimal places (e.g. 98.76). (d) Calculate the sample standard deviation for solution 2: s1 = i Round your answer to three decimal places (e.g. 98.765). (e) Test the hypothesis Ho : µ1 = µ2 vs Hj : µ1 # 42. Calculate to = i Round your answer to two decimal places (e.g. 98.76). (f) Do the data support the claim that the mean etch rate is different for the two solutions? Use a = 0.05. (g) Calculate a 95% two-sided confidence interval on the difference in mean etch rate. (Calculate using the following order:I1 – 12) (i < H1 - H2 S i ) Round your answers to three decimal places (e.g. 98.765).
In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 Solution 2 9.8 10.2 10.3 10.6 9.4 10.3 10.6 10.2 9.3 10.0 10.7 10.7 9.6 10.3 10.4 10.4 10.2 10.1 10.5 10.3 (a) Calculate the sample mean for solution 1:x1 = 3.632 Round your answer to two decimal places (e.g. 98.76). (b) Calculate the sample standard deviation for solution 1: s1 = i Round your answer to three decimal places (e.g. 98.765). (c) Calculate the sample mean for solution 2:2 = Round your answer to two decimal places (e.g. 98.76). (d) Calculate the sample standard deviation for solution 2: s1 = i Round your answer to three decimal places (e.g. 98.765). (e) Test the hypothesis Ho : µ1 = µ2 vs Hj : µ1 # 42. Calculate to = i Round your answer to two decimal places (e.g. 98.76). (f) Do the data support the claim that the mean etch rate is different for the two solutions? Use a = 0.05. (g) Calculate a 95% two-sided confidence interval on the difference in mean etch rate. (Calculate using the following order:I1 – 12) (i < H1 - H2 S i ) Round your answers to three decimal places (e.g. 98.765).
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
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Transcribed Image Text:In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to
metalization. The etch rate is an important characteristic in this process and known to follow a normal distribution. Two different
etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal.
The etch rates are as follows (in mils per minute):
Solution 1
Solution 2
9.8
10.2
10.3 10.6
9.4
10.3
10.6 10.2
9.3
10.0
10.7 10.7
9.6
10.3
10.4 10.4
10.2 10.1
10.5 10.3
(a) Calculate the sample mean for solution 1:Ij =
i
3.632
Round your answer to two decimal places (e.g.
98.76).
(b) Calculate the sample standard deviation for solution 1: s1 = i
Round your answer to three decimal
places (e.g. 98.765).
(c) Calculate the sample mean for solution 2:2 =
i
Round your answer to two decimal places (e.g.
98.76).
(d) Calculate the sample standard deviation for solution 2: s1 = i
Round your answer to three decimal
places (e.g. 98.765).
(e) Test the hypothesis Ho : u1 = µ2 vs H1 : H1 # H2.
Calculate to =
Round your answer to two decimal places (e.g. 98.76).
(f) Do the data support the claim that the mean etch rate is different for the two solutions? Use a = 0.05.
(g) Calculate a 95% two-sided confidence interval on the difference in mean etch rate.
(Calculate using the following order:I – X2)
(i
< H1 - H2 S
i
) Round your answers to three decimal places (e.g.
98.765).
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