A silicon pn junction at T-300 K with zero applied bias has doping concentration of Np=5x101 cm, NA-5x105 cm, n-1.5x1010 cm³, and E-11.9. a- Determine W in um, and (Emax| in (V/m). b- Determine W in pm, and [Emax| in (V/m) when the pn junction is reverse-biased at VR= 8V.
A silicon pn junction at T-300 K with zero applied bias has doping concentration of Np=5x101 cm, NA-5x105 cm, n-1.5x1010 cm³, and E-11.9. a- Determine W in um, and (Emax| in (V/m). b- Determine W in pm, and [Emax| in (V/m) when the pn junction is reverse-biased at VR= 8V.
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![as
A silicon pn junction at T=300 K with zero applied bias has doping concentration of Np=5×10' cm³,
NA-5x105 cm³, n=1.5×1010 cm³, and ɛ-11.9.
a- Determine W in µm, and [Emax| in (V/m).
b- Determine W in µm, and [Emax| in (V/m) when the pn junction is reverse-biased at VR= 8V.](/v2/_next/image?url=https%3A%2F%2Fcontent.bartleby.com%2Fqna-images%2Fquestion%2Fe861e652-9715-4087-a97b-e945af2fb941%2F5aca3564-cd96-4a2d-8b65-8a35fce4b656%2F0bwuevf_processed.jpeg&w=3840&q=75)
Transcribed Image Text:as
A silicon pn junction at T=300 K with zero applied bias has doping concentration of Np=5×10' cm³,
NA-5x105 cm³, n=1.5×1010 cm³, and ɛ-11.9.
a- Determine W in µm, and [Emax| in (V/m).
b- Determine W in µm, and [Emax| in (V/m) when the pn junction is reverse-biased at VR= 8V.
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