6. Give one advantage of contact printing over proximity printing. Give one disadvantage of contact printing compared to proximity printing. 7. A pattern is to be printed using deep UV radiation for the exposure. Should the mask material be made of glass or quartz? Why? 8. Pattern resolution is increased by decreasing exposure wavelength. If a projection printer is used, will the objective lens need to be redesigned? Why or why not? 9. In a clean room rated at class 1000, on the average, how many particles per cubic meter are there? Assume a particle size of 1 um. 10. After exposing a resist, why is it a good idea to bake the resist? 11. When positive resist is exposed, what happens to its solubility? 12.With respect to transferring a pattern to the resist, what is meant by resolution? 13.What kind of cleaning process is best suited for a wafer before it is oxidized?
6. Give one advantage of contact printing over proximity printing. Give
one disadvantage of contact printing compared to proximity printing.
7. A pattern is to be printed using deep UV radiation for the exposure.
Should the mask material be made of glass or quartz? Why?
8. Pattern resolution is increased by decreasing exposure wavelength. If
a projection printer is used, will the objective lens need to be redesigned?
Why or why not?
9. In a clean room rated at class 1000, on the average, how many particles per
cubic meter are there? Assume a particle size of 1 um.
10. After exposing a resist, why is it a good idea to bake the resist?
11. When positive resist is exposed, what happens to its solubility?
12.With respect to transferring a pattern to the resist, what is meant by
resolution?
13.What kind of cleaning process is best suited for a wafer before it is
oxidized?
The following answers provide explanations to various questions related to semiconductor processing, including photolithography, pattern transfer, and wafer cleaning. These answers cover topics such as the advantages and disadvantages of different printing techniques, the choice of mask material for deep UV radiation exposure, the effects of exposure wavelength on pattern resolution, the importance of baking the resist after exposure, and the different factors that can affect pattern resolution and wafer cleaning. Understanding these concepts is crucial in the field of semiconductor processing, as they play a vital role in the fabrication of microelectronic devices such as microprocessors, memory chips, and sensors.
Trending now
This is a popular solution!
Step by step
Solved in 2 steps
