6. Give one advantage of contact printing over proximity printing. Give one disadvantage of contact printing compared to proximity printing.  7. A pattern is to be printed using deep UV radiation for the exposure. Should the mask material be made of glass or quartz? Why?  8. Pattern resolution is increased by decreasing exposure wavelength. If a projection printer is used, will the objective lens need to be redesigned? Why or why not?  9. In a clean room rated at class 1000, on the average, how many particles per cubic meter are there? Assume a particle size of 1 um.  10. After exposing a resist, why is it a good idea to bake the resist?  11. When positive resist is exposed, what happens to its solubility?  12.With respect to transferring a pattern to the resist, what is meant by resolution?  13.What kind of cleaning process is best suited for a wafer before it is oxidized?

Chemistry
10th Edition
ISBN:9781305957404
Author:Steven S. Zumdahl, Susan A. Zumdahl, Donald J. DeCoste
Publisher:Steven S. Zumdahl, Susan A. Zumdahl, Donald J. DeCoste
Chapter1: Chemical Foundations
Section: Chapter Questions
Problem 1RQ: Define and explain the differences between the following terms. a. law and theory b. theory and...
icon
Related questions
Question

6. Give one advantage of contact printing over proximity printing. Give
one disadvantage of contact printing compared to proximity printing. 
7. A pattern is to be printed using deep UV radiation for the exposure.
Should the mask material be made of glass or quartz? Why? 
8. Pattern resolution is increased by decreasing exposure wavelength. If
a projection printer is used, will the objective lens need to be redesigned?
Why or why not? 
9. In a clean room rated at class 1000, on the average, how many particles per
cubic meter are there? Assume a particle size of 1 um. 
10. After exposing a resist, why is it a good idea to bake the resist? 
11. When positive resist is exposed, what happens to its solubility? 
12.With respect to transferring a pattern to the resist, what is meant by
resolution? 
13.What kind of cleaning process is best suited for a wafer before it is
oxidized? 

Expert Solution
Step 1

The following answers provide explanations to various questions related to semiconductor processing, including photolithography, pattern transfer, and wafer cleaning. These answers cover topics such as the advantages and disadvantages of different printing techniques, the choice of mask material for deep UV radiation exposure, the effects of exposure wavelength on pattern resolution, the importance of baking the resist after exposure, and the different factors that can affect pattern resolution and wafer cleaning. Understanding these concepts is crucial in the field of semiconductor processing, as they play a vital role in the fabrication of microelectronic devices such as microprocessors, memory chips, and sensors.

 
trending now

Trending now

This is a popular solution!

steps

Step by step

Solved in 2 steps

Blurred answer
Knowledge Booster
Gravimetric Analysis
Learn more about
Need a deep-dive on the concept behind this application? Look no further. Learn more about this topic, chemistry and related others by exploring similar questions and additional content below.
Similar questions
Recommended textbooks for you
Chemistry
Chemistry
Chemistry
ISBN:
9781305957404
Author:
Steven S. Zumdahl, Susan A. Zumdahl, Donald J. DeCoste
Publisher:
Cengage Learning
Chemistry
Chemistry
Chemistry
ISBN:
9781259911156
Author:
Raymond Chang Dr., Jason Overby Professor
Publisher:
McGraw-Hill Education
Principles of Instrumental Analysis
Principles of Instrumental Analysis
Chemistry
ISBN:
9781305577213
Author:
Douglas A. Skoog, F. James Holler, Stanley R. Crouch
Publisher:
Cengage Learning
Organic Chemistry
Organic Chemistry
Chemistry
ISBN:
9780078021558
Author:
Janice Gorzynski Smith Dr.
Publisher:
McGraw-Hill Education
Chemistry: Principles and Reactions
Chemistry: Principles and Reactions
Chemistry
ISBN:
9781305079373
Author:
William L. Masterton, Cecile N. Hurley
Publisher:
Cengage Learning
Elementary Principles of Chemical Processes, Bind…
Elementary Principles of Chemical Processes, Bind…
Chemistry
ISBN:
9781118431221
Author:
Richard M. Felder, Ronald W. Rousseau, Lisa G. Bullard
Publisher:
WILEY