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2. In lithography process, you are asked to deposit nanoparticle in hc Resist A metal Substrate After development N of resist dep (a) Striping resist Deposition of nanomaterial-Etching (b) Etching -→ Deposition of nanomaterial Striping resist (c) Deposition of nanomaterial - Striping resist Etching

2. In lithography process, you are asked to deposit nanoparticle in hc Resist A metal Substrate After development N of resist dep (a) Striping resist Deposition of nanomaterial-Etching (b) Etching -→ Deposition of nanomaterial Striping resist (c) Deposition of nanomaterial - Striping resist Etching

Elements Of Electromagnetics
Elements Of Electromagnetics
7th Edition
ISBN:9780190698614
Author:Sadiku, Matthew N. O.
Publisher:Sadiku, Matthew N. O.
ChapterMA: Math Assessment
Section: Chapter Questions
Problem 1.1MA
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2. In lithography process, you are asked to deposit nanoparticle in holes. Select the process steps in order. Resist A metal elching Substrate After development SHiping Nanomaterial of resist deposited in holes wetChem cal) (a) Striping resist Deposition of nanomaterial -Etching (b) Etching - Deposition of nanomaterial Striping resist (c) Deposition of nanomaterial- Striping resist Etching Cmone
Transcribed Image Text:2. In lithography process, you are asked to deposit nanoparticle in holes. Select the process steps in order. Resist A metal elching Substrate After development SHiping Nanomaterial of resist deposited in holes wetChem cal) (a) Striping resist Deposition of nanomaterial -Etching (b) Etching - Deposition of nanomaterial Striping resist (c) Deposition of nanomaterial- Striping resist Etching Cmone
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