A ski jumper starts from rest 50.0 m above the ground on a frictionless track and flies off the track at an angle of 45.0° above the horizontal and at a height of 10.0 m above the level ground. Neglect air resistance, (a) What is her speed when she leaves the track? (b) What is the maximum altitude she attains after leaving the track? (c) Where does she land relative to the end of the track?
A ski jumper starts from rest 50.0 m above the ground on a frictionless track and flies off the track at an angle of 45.0° above the horizontal and at a height of 10.0 m above the level ground. Neglect air resistance, (a) What is her speed when she leaves the track? (b) What is the maximum altitude she attains after leaving the track? (c) Where does she land relative to the end of the track?
Solution Summary: The author explains that the speed of the ski jumper when she leaves the track is 28.0m/s.
A ski jumper starts from rest 50.0 m above the ground on a frictionless track and flies off the track at an angle of 45.0° above the horizontal and at a height of 10.0 m above the level ground. Neglect air resistance, (a) What is her speed when she leaves the track? (b) What is the maximum altitude she attains after leaving the track? (c) Where does she land relative to the end of the track?
You want to fabricate a soft microfluidic chip like the one below. How would you go about
fabricating this chip knowing that you are targeting a channel with a square cross-sectional
profile of 200 μm by 200 μm. What materials and steps would you use and why? Disregard the
process to form the inlet and outlet.
Square Cross Section
1. What are the key steps involved in the fabrication of a semiconductor device.
2. You are hired by a chip manufacturing company, and you are asked to prepare a silicon wafer
with the pattern below. Describe the process you would use.
High Aspect
Ratio
Trenches
Undoped Si Wafer
P-doped Si
3. You would like to deposit material within a high aspect ratio trench. What approach would you
use and why?
4. A person is setting up a small clean room space to carry out an outreach activity to educate high
school students about patterning using photolithography. They obtained a positive photoresist, a
used spin coater, a high energy light lamp for exposure and ordered a plastic transparency mask
with a pattern on it to reduce cost. Upon trying this set up multiple times they find that the full
resist gets developed, and they are unable to transfer the pattern onto the resist. Help them
troubleshoot and find out why pattern of transfer has not been successful.
5. You are given a composite…
Two complex values are z1=8 + 8i, z2=15 + 7 i. z1∗ and z2∗ are the complex conjugate values.
Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for (z1-z∗2)/z1+z2∗. Find r and θ for (z1−z2∗)z1z2∗ Please show all steps
Campbell Essential Biology with Physiology (5th Edition)
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