Plasma etching is essential to the fine-line pattern transfer in current semiconductor processes. An article gives the accompanying data (read from a graph) on chlorine flow (x, in SCCM) through a nozzle used in the etching mechanism and etch rate (y, in 100 A/min). 1.5 1.6 2.0 2.5 2.5 3.0 3.5 3.5 3.9 y 24.5 24.5 25.5 29.5 33.5 39.0 40.5 44.5 50.0 (a) Create a 99% two-sided confidence interval for the true average change in etch rate associated with a 1-SCCM increase in flow rate. (Round your answers to 3 decimal places, if needed.) (b) Create a 99% two-sided confidence interval for the true average etch rate when flow is 3.5. (Round your answers to 3 decimal places, if needed.) Predicted value = Standard error = (c) Create a 99% two-sided prediction interval for an etch rate when flow is 3.5. (Round your answers to 3 decimal places, if needed.) Predicted value = Standard error =
Plasma etching is essential to the fine-line pattern transfer in current semiconductor processes. An article gives the accompanying data (read from a graph) on chlorine flow (x, in SCCM) through a nozzle used in the etching mechanism and etch rate (y, in 100 A/min). 1.5 1.6 2.0 2.5 2.5 3.0 3.5 3.5 3.9 y 24.5 24.5 25.5 29.5 33.5 39.0 40.5 44.5 50.0 (a) Create a 99% two-sided confidence interval for the true average change in etch rate associated with a 1-SCCM increase in flow rate. (Round your answers to 3 decimal places, if needed.) (b) Create a 99% two-sided confidence interval for the true average etch rate when flow is 3.5. (Round your answers to 3 decimal places, if needed.) Predicted value = Standard error = (c) Create a 99% two-sided prediction interval for an etch rate when flow is 3.5. (Round your answers to 3 decimal places, if needed.) Predicted value = Standard error =
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
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