Identify and describe the following surface analysis techniques AES, AFM, EDS, FIB, FTIR, SEM, TEM, TOF-SIMS, and XPS

Atomic Force Microscopy (AFM)

Atomic Force Microscopy (AFM) is an analysis that quantifies surface roughness of samples down to the angstrom-scale by presenting images with atomic or near-atomic-resolution surface topography. AFM can also provide quantitative measurements of feature sizes.

AFM is mostly used to create three-dimensional surface topographic imagining, including surface roughness, grain size, step height and pitch.

Energy Dispersive X-Ray Spectroscopy (EDS)

Energy Dispersive X-Ray Spectroscopy (EDS) is a technique that can be used along with applications such as Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM). When used along with these imaging tools, EDS can be used to determine the elemental composition of individual points or to map out the lateral distribution of elements from the imaged area, which can be as small as nanometers in diameter.

Apart from its most common use of providing imagining and elemental composition of small areas, EDS is also used for identification and mapping of elements present in defects.

Fourier Transform Infrared Spectroscopy (FTIR)

Fourier Transform Infrared Spectroscopy (FTIR) is an analysis that helps identify or characterize organic materials through creating a spectrum that shows molecular vibrations. It can also be used to detect a number of inorganic compounds, and measure the interstitial oxygen content in bulk silicon in semiconductors.

The most common uses of FTIR are identification of organic contaminants, characterization of organic materials. It can also be used for quantification of O and H in Si and H in SiN wafers.

Gas Chromatography Mass Spectrometry (GC-MS)

Gas Chromatography Mass Spectrometry (GC-MS) is a technique that analyzes and quantifies organic volatile and semi-volatile compounds. Gas chromatography (GC) is used to separate the mixture into individual components while Mass spectrometry (MS) is used to identify the various components from their mass spectra and quantify each through the use of standards.

Apart from the common use in identifying and quantifying volatile organic compounds in mixtures, GC-MS can also be used in outgassing studies, testing for residual solvents, evaluating extracts from plastics and evaluating contaminants on semiconductor wafers.

Inductively Coupled Plasma Atomic Emission Spectrophotometry (ICP-AES)

Inductively Coupled Plasma Atomic Emission Spectrophotometry (ICP-AES) is a technique that enables quantitative determination of trace elements. It is also a widely accepted technique in chemical compositional analysis.

Scanning Auger Microscopy (SAM)

Scanning Auger Microscopy (SAM) is an analysis that produces images of the sample surface. Its excellent spatial resolution enables detection and characterization of almost all elements present in the periodic table except hydrogen and helium. This analysis is particularly important for the analysis of very small phases in metallurgical/corrosion studies and in many integrated circuit applications.

Scanning Electron Microscopy (SEM)

Scanning Electron Microscopy (SEM) is a widely used analytical tool that provides extremely detailed images of the sample surface and near-surface. Along with an Energy Dispersive X-ray Spectroscopy (EDS) detector, SEM can offer elemental identification of nearly the entire periodic table.

SEM is mostly used to create high resolution images and perform elemental microanalysis and particle characterization.