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6.65. (a) Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 6E.23. Use these data to set up a control chart on oxide thickness and a moving range chart. Does the process exhibit statistical control? Does oxide thickness follow a normal distribution? (b) Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are as follows: Oxide Thickness Oxide Thickness Wafer Wafer 54.3 6 51.5 2 57.5 58.4 3 64.8 8 67.5 4 62.1 9. 61.1 5 59.6 10 63.3

6.65. (a) Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 6E.23. Use these data to set up a control chart on oxide thickness and a moving range chart. Does the process exhibit statistical control? Does oxide thickness follow a normal distribution? (b) Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are as follows: Oxide Thickness Oxide Thickness Wafer Wafer 54.3 6 51.5 2 57.5 58.4 3 64.8 8 67.5 4 62.1 9. 61.1 5 59.6 10 63.3

MATLAB: An Introduction with Applications
MATLAB: An Introduction with Applications
6th Edition
ISBN:9781119256830
Author:Amos Gilat
Publisher:Amos Gilat
Chapter1: Starting With Matlab
Section: Chapter Questions
Problem 1P
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6.65. (a) Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 6E.23. Use these data to set up a control chart on oxide thickness and a moving range chart. Does the process exhibit statistical control? Does oxide thickness follow a normal distribution? (b) Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are as follows: Oxide Oxide Wafer Thickness Wafer Thickness 1 54.3 6. 51.5 2 57.5 7 58.4 3 64.8 8 67.5 4 62.1 61.1 5 59.6 10 63.3
Transcribed Image Text:6.65. (a) Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 6E.23. Use these data to set up a control chart on oxide thickness and a moving range chart. Does the process exhibit statistical control? Does oxide thickness follow a normal distribution? (b) Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are as follows: Oxide Oxide Wafer Thickness Wafer Thickness 1 54.3 6. 51.5 2 57.5 7 58.4 3 64.8 8 67.5 4 62.1 61.1 5 59.6 10 63.3
- TABLE 6E.23 Data. for Exercise 6.65 Oxide Oxide Wafer Thickness Wafer Thickness 45.4 16 58.4 2 48.6 17 51.0 3 49.5 18 41.2 4 44.0 19 47.1 5 50.9 20 45.7 55.2 21 60.6 45.5 22 51.0 52.8 23 53.0 45.3 24 56.0 10 46.3 25 47.2 11 53.9 26 48.0 12 49.8 27 55.9 13 46.9 28 50.0 14 49.8 29 47.9 15 45.1 30 53.4 Plot these observations against the control limits determined in part (a). Is the process in control? (c) Suppose the assignable cause responsible for the out-of-control signal in part (b) is discovered and removed from the process. Twenty additional wafers are subsequently sampled. Plot the oxide thickness against the part (a) control limits. What conclusions can you draw? The new data are shown in Table 6E.25. 6700
Transcribed Image Text:- TABLE 6E.23 Data. for Exercise 6.65 Oxide Oxide Wafer Thickness Wafer Thickness 45.4 16 58.4 2 48.6 17 51.0 3 49.5 18 41.2 4 44.0 19 47.1 5 50.9 20 45.7 55.2 21 60.6 45.5 22 51.0 52.8 23 53.0 45.3 24 56.0 10 46.3 25 47.2 11 53.9 26 48.0 12 49.8 27 55.9 13 46.9 28 50.0 14 49.8 29 47.9 15 45.1 30 53.4 Plot these observations against the control limits determined in part (a). Is the process in control? (c) Suppose the assignable cause responsible for the out-of-control signal in part (b) is discovered and removed from the process. Twenty additional wafers are subsequently sampled. Plot the oxide thickness against the part (a) control limits. What conclusions can you draw? The new data are shown in Table 6E.25. 6700
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