Metallurgical silicon is purified to electronic grade for use in the semiconductor industry by chemicallyseparating it from its impurities. The Si metal reacts in varying degrees with hydrogen chloride gas at3000C to form several polychlorinated silanes. Trichlorosilane (HSiCl3) is liquid at room temperature andis easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted with HCl,how much trichlorosilane is produced? The gases formed contain 21.42% H2SiCl2, 14.29% SiCl4 and therest H2. Also, determine the amount (kg) of HCl used? MW: Si = 28.1 g/mole, Cl = 35.45g/mole. 5. Metallurgical silicon is purified to electronic grade for use in the semiconductor industry by chemicallyseparating it from its impurities. The Si metal reacts in varying degrees with hydrogen chloride gas at300°C to form several polychlorinated silanes. Trichlorosilane (HSIC13) is liquid at room temperature andis easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted with HCI,how much trichlorosilane is produced? The gases formed contain 21.42% H2SICI2, 14.29% SiCIą and therest H2. Also, determine the amount (kg) of HCl used? MW: Si = 28.1 g/mole, Cl = 35.45g/mole.

Material equilibrium, also known as mass balance, is the use of mass conservation to analyse a…

Answered: 5. Metallurgical silicon is purified to…

Introduction to Chemical Engineering Thermodynamics

8th Edition

ISBN:9781259696527

Author:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart

Publisher:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart

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Metallurgical silicon is purified to electronic grade for use in the semiconductor industry by chemically
separating it from its impurities. The Si metal reacts in varying degrees with hydrogen chloride gas at
3000C to form several polychlorinated silanes. Trichlorosilane (HSiCl3

) is liquid at room temperature and
is easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted with HCl,
how much trichlorosilane is produced? The gases formed contain 21.42% H2SiCl2, 14.29% SiCl4 and the
rest H2. Also, determine the amount (kg) of HCl used? MW: Si = 28.1 g/mole, Cl = 35.45g/mole.

5. Metallurgical silicon is purified to electronic grade for use in the semiconductor industry by chemically
separating it from its impurities. The Si metal reacts in varying degrees with hydrogen chloride gas at
300°C to form several polychlorinated silanes. Trichlorosilane (HSIC13) is liquid at room temperature and
is easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted with HCI,
how much trichlorosilane is produced? The gases formed contain 21.42% H2SICI2, 14.29% SiCIą and the
rest H2. Also, determine the amount (kg) of HCl used? MW: Si = 28.1 g/mole, Cl = 35.45g/mole.

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