30.10 Silicon tetrachloride, SiCl4, is an important chemical used in the manufacture of microelectronic devices. A common impur- ity in silicon tetrachloride is trichlorosilane, SİHCI3. High purity SiCl4 is manufactured by bubbling chlorine Cl2, gas into unpur- ified liquid SiCl4. In the presence of ultraviolet light, the dissolved Cl2 reacts with residual trichlorosilane in the unpurified liquid to form silicon tetrachloride according to the homogeneous reaction; SİHCI3 + Cl2 → SiCl4 + HCI Estimate the liquid-film mass-transfer coefficient for the transfer of Cl2 (species A) into liquid SiCl4, assuming pure Cl2 gas at 298 K and 1.0 atm is bubbled into the liquid SiCl4 with a mean bubble diameter of 2 mm. At 298 K, the density of liquid SiCl4 is 1.47 g/cm³, the viscosity of liquid SiCl4 is 0.52 cp, and the liquid diffusivity of Cl2 in SiCl4 is 5.6 × 10-³ cm²/s. The dissolution of Cl2 gas in SiCl4 liquid is defined by pA = H x where H is 6.76 atm at 298 K. What is the flux of Cl2, assuming that the Cl2 is instanta- neously consumed once it reaches the bulk liquid phase? You may assume that the total molar concentration of the mixture approx- imates the molar concentration of pure liquid SiCl4.
30.10 Silicon tetrachloride, SiCl4, is an important chemical used in the manufacture of microelectronic devices. A common impur- ity in silicon tetrachloride is trichlorosilane, SİHCI3. High purity SiCl4 is manufactured by bubbling chlorine Cl2, gas into unpur- ified liquid SiCl4. In the presence of ultraviolet light, the dissolved Cl2 reacts with residual trichlorosilane in the unpurified liquid to form silicon tetrachloride according to the homogeneous reaction; SİHCI3 + Cl2 → SiCl4 + HCI Estimate the liquid-film mass-transfer coefficient for the transfer of Cl2 (species A) into liquid SiCl4, assuming pure Cl2 gas at 298 K and 1.0 atm is bubbled into the liquid SiCl4 with a mean bubble diameter of 2 mm. At 298 K, the density of liquid SiCl4 is 1.47 g/cm³, the viscosity of liquid SiCl4 is 0.52 cp, and the liquid diffusivity of Cl2 in SiCl4 is 5.6 × 10-³ cm²/s. The dissolution of Cl2 gas in SiCl4 liquid is defined by pA = H x where H is 6.76 atm at 298 K. What is the flux of Cl2, assuming that the Cl2 is instanta- neously consumed once it reaches the bulk liquid phase? You may assume that the total molar concentration of the mixture approx- imates the molar concentration of pure liquid SiCl4.
Introduction to Chemical Engineering Thermodynamics
8th Edition
ISBN:9781259696527
Author:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Publisher:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Chapter1: Introduction
Section: Chapter Questions
Problem 1.1P
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Transcribed Image Text:30.10 Silicon tetrachloride, SiCl4, is an important chemical used
in the manufacture of microelectronic devices. A common impur-
ity in silicon tetrachloride is trichlorosilane, SİHCI3. High purity
SiCl4 is manufactured by bubbling chlorine Cl2, gas into unpur-
ified liquid SiCl4. In the presence of ultraviolet light, the dissolved
Cl2 reacts with residual trichlorosilane in the unpurified liquid to
form silicon tetrachloride according to the homogeneous reaction;
SİHCI3 + Cl2 → SiCl4 + HCI
Estimate the liquid-film mass-transfer coefficient for the transfer of
Cl2 (species A) into liquid SiCl4, assuming pure Cl2 gas at 298 K
and 1.0 atm is bubbled into the liquid SiCl4 with a mean bubble
diameter of 2 mm. At 298 K, the density of liquid SiCl4 is
1.47 g/cm³, the viscosity of liquid SiCl4 is 0.52 cp, and the liquid
diffusivity of Cl2 in SiCl4 is 5.6 × 10-³ cm²/s. The dissolution of
Cl2 gas in SiCl4 liquid is defined by pA = H x where H is 6.76
atm at 298 K.
What is the flux of Cl2, assuming that the Cl2 is instanta-
neously consumed once it reaches the bulk liquid phase? You may
assume that the total molar concentration of the mixture approx-
imates the molar concentration of pure liquid SiCl4.
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