2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light source with a wavelength of 436nm. What is the minimum feature size you would expect the stepper to be able to produce? What would be the maximum thickness of resist that the stepper could successfully expose?
2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light source with a wavelength of 436nm. What is the minimum feature size you would expect the stepper to be able to produce? What would be the maximum thickness of resist that the stepper could successfully expose?
Elements Of Electromagnetics
7th Edition
ISBN:9780190698614
Author:Sadiku, Matthew N. O.
Publisher:Sadiku, Matthew N. O.
ChapterMA: Math Assessment
Section: Chapter Questions
Problem 1.1MA
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![2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light
source with a wavelength of 436nm. What is the minimum feature size you would expect
the stepper to be able to produce? What would be the maximum thickness of resist that the
stepper could successfully expose?](/v2/_next/image?url=https%3A%2F%2Fcontent.bartleby.com%2Fqna-images%2Fquestion%2F52b712e9-f47d-4279-b6b0-2e80aee1594e%2Ff266382a-7013-41c9-ac5c-174408982d62%2Fgodgucd_processed.jpeg&w=3840&q=75)
Transcribed Image Text:2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light
source with a wavelength of 436nm. What is the minimum feature size you would expect
the stepper to be able to produce? What would be the maximum thickness of resist that the
stepper could successfully expose?
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