You want to fabricate a soft microfluidic chip like the one below. How would you go about fabricating this chip knowing that you are targeting a channel with a square cross-sectional profile of 200 μm by 200 μm. What materials and steps would you use and why? Disregard the process to form the inlet and outlet. Square Cross Section

1. What are the key steps involved in the fabrication of a semiconductor device. 2. You are hired by a chip manufacturing company, and you are asked to prepare a silicon wafer with the pattern below. Describe the process you would use. High Aspect Ratio Trenches Undoped Si Wafer P-doped Si 3. You would like to deposit material within a high aspect ratio trench. What approach would you use and why? 4. A person is setting up a small clean room space to carry out an outreach activity to educate high school students about patterning using photolithography. They obtained a positive photoresist, a used spin coater, a high energy light lamp for exposure and ordered a plastic transparency mask with a pattern on it to reduce cost. Upon trying this set up multiple times they find that the full resist gets developed, and they are unable to transfer the pattern onto the resist. Help them troubleshoot and find out why pattern of transfer has not been successful. 5. You are given a composite…

Two complex values are  z1=8 + 8i,  z2=15 + 7 i.  z1∗  and  z2∗ are the complex conjugate values. Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for (z1-z∗2)/z1+z2∗. Find r and θ for (z1−z2∗)z1z2∗   Please show all steps