In Fig. 15-28, a spring–block system is put into SHM in two experiments. In the first, the block is pulled from the equilibrium position through a displacement d 1 and then released. In the second, it is pulled from the equilibrium position through a greater displacement d 2 and then released. Are the (a) amplitude, (b) period, (c) frequency, (d) maximum kinetic energy, and (e) maximum potential energy in the second experiment greater than, less than, or the same as those in the first experiment? Figure 15-28 Question 11.
In Fig. 15-28, a spring–block system is put into SHM in two experiments. In the first, the block is pulled from the equilibrium position through a displacement d 1 and then released. In the second, it is pulled from the equilibrium position through a greater displacement d 2 and then released. Are the (a) amplitude, (b) period, (c) frequency, (d) maximum kinetic energy, and (e) maximum potential energy in the second experiment greater than, less than, or the same as those in the first experiment? Figure 15-28 Question 11.
In Fig. 15-28, a spring–block system is put into SHM in two experiments. In the first, the block is pulled from the equilibrium position through a displacement d1 and then released. In the second, it is pulled from the equilibrium position through a greater displacement d2 and then released. Are the (a) amplitude, (b) period, (c) frequency, (d) maximum kinetic energy, and (e) maximum potential energy in the second experiment greater than, less than, or the same as those in the first experiment?
Figure 15-28 Question 11.
Definition Definition Special type of oscillation where the force of restoration is directly proportional to the displacement of the object from its mean or initial position. If an object is in motion such that the acceleration of the object is directly proportional to its displacement (which helps the moving object return to its resting position) then the object is said to undergo a simple harmonic motion. An object undergoing SHM always moves like a wave.
You want to fabricate a soft microfluidic chip like the one below. How would you go about
fabricating this chip knowing that you are targeting a channel with a square cross-sectional
profile of 200 μm by 200 μm. What materials and steps would you use and why? Disregard the
process to form the inlet and outlet.
Square Cross Section
1. What are the key steps involved in the fabrication of a semiconductor device.
2. You are hired by a chip manufacturing company, and you are asked to prepare a silicon wafer
with the pattern below. Describe the process you would use.
High Aspect
Ratio
Trenches
Undoped Si Wafer
P-doped Si
3. You would like to deposit material within a high aspect ratio trench. What approach would you
use and why?
4. A person is setting up a small clean room space to carry out an outreach activity to educate high
school students about patterning using photolithography. They obtained a positive photoresist, a
used spin coater, a high energy light lamp for exposure and ordered a plastic transparency mask
with a pattern on it to reduce cost. Upon trying this set up multiple times they find that the full
resist gets developed, and they are unable to transfer the pattern onto the resist. Help them
troubleshoot and find out why pattern of transfer has not been successful.
5. You are given a composite…
Two complex values are z1=8 + 8i, z2=15 + 7 i. z1∗ and z2∗ are the complex conjugate values.
Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for (z1-z∗2)/z1+z2∗. Find r and θ for (z1−z2∗)z1z2∗ Please show all steps
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