What are the main components that make up a photoresist? 2. What is a two-component resist? What are the two components? 3. What does the concept of dose involve? 4. What effect does the dose have on the molecular weight of a negative resist? (Does it cause it to decrease or increase?) 5. Identify one problem that can arise when positive resist is applied to a thermally grown oxide wafer (silicon substrate). How can this problem be resolved?
answer all of them if you can answer all of them. Answer #3
1. What are the main components that make up a photoresist?
2. What is a two-component resist? What are the two components?
3. What does the concept of dose involve?
4. What effect does the dose have on the molecular weight of a negative
resist? (Does it cause it to decrease or increase?)
5. Identify one problem that can arise when positive resist is applied to a
thermally grown oxide wafer (silicon substrate). How can this problem
be resolved?
This answer addresses a series of questions related to photolithography, a process used in microfabrication to create patterns on a substrate using light and photoresist materials. The questions cover various aspects of photoresist composition, resist types, the concept of dose, and potential issues that can arise when using certain types of resist materials on specific substrates. The answers provide a brief but informative overview of each topic, helping to clarify and contextualize the concepts involved in photolithography.
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