were used in the ex

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11. How many treatments were used in the experiment? 4 decimal ans

An experiment was described to determine the effect of C2F6 flow rate on the uniformity of the etch on a silicon
wafer used in integrated circuit manufacturing. The resulting table of random sampling is shown.
Observations
C₂F6 Flow
(SCCM)
1
2
3
4
5
6
125
2.7
4.6 2.6
3.0
3.2
3.8
160
4.9
4.6 5.0 4.2
3.6
4.2
200
4.6
3.4
2.9
3.5 4.1
5.1
Transcribed Image Text:An experiment was described to determine the effect of C2F6 flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. The resulting table of random sampling is shown. Observations C₂F6 Flow (SCCM) 1 2 3 4 5 6 125 2.7 4.6 2.6 3.0 3.2 3.8 160 4.9 4.6 5.0 4.2 3.6 4.2 200 4.6 3.4 2.9 3.5 4.1 5.1
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