The photoresist thickness is one the quality characteristic in intagre circuits . A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits Twelve wafers were tested and the following photoresist thickness measurements were observed 13.3987, 13.3957, 13.3902, 13.4015 , 13.4001 13.3918, 13.3965, 13.3925, 13.3946 , 13.3939, 12.4005 and 13.4002 Assume that thickness is normally distributed  a) Test the hypothesis that mean thickness is 13.4x1000 A. Use a = 0.05 and assume a two-sided  alternative  b ) Find a 99% two-sided confidence interval on mean photoresist thickness  c) Find a 95% two-sided confidence interval on standard deviation of photoresist thickness

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The photoresist thickness is one the quality characteristic in intagre circuits . A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits Twelve wafers were tested and the following photoresist thickness measurements were observed 13.3987, 13.3957, 13.3902, 13.4015 , 13.4001 13.3918, 13.3965, 13.3925, 13.3946 , 13.3939, 12.4005 and 13.4002 Assume that thickness is normally distributed 

a) Test the hypothesis that mean thickness is 13.4x1000 A. Use a = 0.05 and assume a two-sided  alternative 

b ) Find a 99% two-sided confidence interval on mean photoresist thickness 

c) Find a 95% two-sided confidence interval on standard deviation of photoresist thickness 

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