The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determined for each wafer in a sample size of n = 100, resulting in the following frequencies: Number of particles 0 Number of particles Frequency Frequency 1 8 12 1 2 9 4 23 3 10 12 11 53 45 11 12 1 15 13 2 6 18 14 1 7 10 What proportion of the sampled wafers had at least two particles? What proportion of the sampled wafers had at most ten particles? What proportion of the sampled wafers had less than four particles? What proportion of the sampled wafers had between four and nine particles, inclusive?

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The number of contaminating particles on a silicon wafer prior to a
certain rinsing process was determined for each wafer in a sample size
of n = 100, resulting in the following frequencies:
Number of particles
0
Number of particles Frequency
Frequency
1
8
12
1
2
9
4
23
3
10
12
11
53
45
11
12
1
15
13
2
6
18
14
1
7
10
What proportion of the sampled wafers had at least two particles?
What proportion of the sampled wafers had at most ten particles?
What proportion of the sampled wafers had less than four particles?
What proportion of the sampled wafers had between four and nine
particles, inclusive?
Transcribed Image Text:The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determined for each wafer in a sample size of n = 100, resulting in the following frequencies: Number of particles 0 Number of particles Frequency Frequency 1 8 12 1 2 9 4 23 3 10 12 11 53 45 11 12 1 15 13 2 6 18 14 1 7 10 What proportion of the sampled wafers had at least two particles? What proportion of the sampled wafers had at most ten particles? What proportion of the sampled wafers had less than four particles? What proportion of the sampled wafers had between four and nine particles, inclusive?
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