Question * Consider a homogeneously doped n-type semiconductor at 300K. The electron concentration is equal to 10" cm', n- 10"cm', - 1000 cmV-sec, ,- 500 cm'N-sec. To-2 10's. Tpo1 10's and the applied electric field is zero. A light beam in x-direction was applied to the sample resulting excess e-h pair of 2x10 cm at x-0(edge of the sample). Assuming steady state, then hole diffusion current density at x-20jum is .A/em. (use kT-0.025eV at 300K) a)43 b)62 e) 93 d) 185 e) 280 a
Question * Consider a homogeneously doped n-type semiconductor at 300K. The electron concentration is equal to 10" cm', n- 10"cm', - 1000 cmV-sec, ,- 500 cm'N-sec. To-2 10's. Tpo1 10's and the applied electric field is zero. A light beam in x-direction was applied to the sample resulting excess e-h pair of 2x10 cm at x-0(edge of the sample). Assuming steady state, then hole diffusion current density at x-20jum is .A/em. (use kT-0.025eV at 300K) a)43 b)62 e) 93 d) 185 e) 280 a
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