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Problem 2. A vessel (1) contains 1 kg of water at 500 °C and 200 kPa pressure. The second vessel (2) contains 1 kg of saturated water vapour at 200 kPa. The contents of the vessels (1 and 2) are mixed in a constant pressure and adiabatic process. Find the final temperature and the entropy generation (Sgen) for the mixing process. Vessel 1 Vessel 2 1 kg, 500 °C, 200 kPa 1 kg saturated wafer vapour 200 kPa, → mixture T = ?; Sgen = ?

Problem 2. A vessel (1) contains 1 kg of water at 500 °C and 200 kPa pressure. The second vessel (2) contains 1 kg of saturated water vapour at 200 kPa. The contents of the vessels (1 and 2) are mixed in a constant pressure and adiabatic process. Find the final temperature and the entropy generation (Sgen) for the mixing process. Vessel 1 Vessel 2 1 kg, 500 °C, 200 kPa 1 kg saturated wafer vapour 200 kPa, → mixture T = ?; Sgen = ?

Introduction to Chemical Engineering Thermodynamics
Introduction to Chemical Engineering Thermodynamics
8th Edition
ISBN:9781259696527
Author:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Publisher:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Chapter1: Introduction
Section: Chapter Questions
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Problem 2. A vessel (1) contains 1 kg of water at 500 °C and 200 kPa pressure. The second vessel (2) contains 1 kg of saturated water vapour at 200 kPa. The contents of the vessels (1 and 2) are mixed in a constant pressure and adiabatic process. Find the final temperature and the entropy generation (Sgen) for the mixing process. Vessel 1 Vessel 2 1 kg saturated wafer vapour 200 kPa, 1 kg, 500 °C, 200 kPa → mixture T = ?; Sgen = ? %3D
Transcribed Image Text:Problem 2. A vessel (1) contains 1 kg of water at 500 °C and 200 kPa pressure. The second vessel (2) contains 1 kg of saturated water vapour at 200 kPa. The contents of the vessels (1 and 2) are mixed in a constant pressure and adiabatic process. Find the final temperature and the entropy generation (Sgen) for the mixing process. Vessel 1 Vessel 2 1 kg saturated wafer vapour 200 kPa, 1 kg, 500 °C, 200 kPa → mixture T = ?; Sgen = ? %3D
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