Metallurgical-grade silicon is purified to electronic grade for use in the semiconductor industry by chemically separating it from its impurities. The Si metal reacts in varying degrees with hydrogen chloride gas at 300°C to form several polychlorinated silanes. Trichlorosilane is liquid at room temperature and is easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted as shown in Figure shown below:   a.     How much trichlorosilane (Stream E) is produced? b.     How much moles of gas stream leaving as overhead distillate (Stream D)?   Si = 28 g/mol; Cl = 35 g/mol ; H= 1 g/mol

Introduction to Chemical Engineering Thermodynamics
8th Edition
ISBN:9781259696527
Author:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Publisher:J.M. Smith Termodinamica en ingenieria quimica, Hendrick C Van Ness, Michael Abbott, Mark Swihart
Chapter1: Introduction
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Metallurgical-grade silicon is purified to electronic grade for use in the semiconductor industry by chemically separating it from its impurities. The Si metal reacts in varying degrees with hydrogen chloride gas at 300°C to form several polychlorinated silanes. Trichlorosilane is liquid at room temperature and is easily separated by fractional distillation from the other gases. If 100 kg of silicon is reacted as shown in Figure shown below:

 

a.     How much trichlorosilane (Stream E) is produced?

b.     How much moles of gas stream leaving as overhead distillate (Stream D)?

 

Si = 28 g/mol; Cl = 35 g/mol ; H= 1 g/mol

Moie %
21.42 H2SiCi2
14.29 SiCI,
64.29 H2
HCI(g)
Si(s)-
Reactor
Distillation
100% HSICI,
Transcribed Image Text:Moie % 21.42 H2SiCi2 14.29 SiCI, 64.29 H2 HCI(g) Si(s)- Reactor Distillation 100% HSICI,
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